Method of and apparatus for detecting pattern defects

• US 4,803,734 A
• Filed: 12/10/1986
• Issued: 02/07/1989
• Est. Priority Date: 12/13/1985
• Status: Expired due to Term

• Current Assignee: SCREEN Holdings Co., Ltd.
• Original Assignee: SCREEN Holdings Co., Ltd.
• Inventors: Onishi, Hiroyuki, Kodama, Eiji, Sano, Tetsuo, Kitakado, Ryuji, Hoki, Tetsuo, Tsujinaka, Hisayuki
• Primary Examiner(s): Boudreau, Leo H.
• Application Number:
  US06/940,272
• Time in Patent Office: 790 Days
• Field of Search: 382/8, 382/30, 382/33, 382/34, 358/106, 356/237
• US Class Current: 382/115
• CPC Class Codes: G01N 21/956 Inspecting patterns on the surface of objects contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G03F 1/84 Inspecting
• CPC Class Codes: G06T 2207/30141 Printed circuit board [PCB]
• CPC Class Codes: G06T 2207/30148 Semiconductor; IC; Wafer
• CPC Class Codes: G06T 7/001 using an image reference approach
• CPC Class Codes: G06V 10/7515 Shifting the patterns to accommodate for positional errors

Abstract

The periphery of an area of a master pattern is expanded by a required number of pixels to define a plurality of master pattern areas two-dimensionally misregistered pixel by pixel, for performing pattern comparison of the respective master pattern areas with an area of an object pattern. The object pattern is deemed defective when all of the comparisons indicate pattern mismatches. The pattern is deemed not defective when at least one comparison indicates a pattern match. Thus, even if an inspected object includes misregistration errors, pattern defects can be detected with high accuracy.

Claims

1. A method of detecting pattern defects by comparing a unit area of a two-dimensional object pattern, said unit area having a prescribed size and formed by digitized picture signals obtained sequentially along scanning lines, with a plurality of areas of a digitized two-dimensional master pattern, said method comprising the steps of:

defining a reference area by expanding the periphery of an area of said master pattern to positionally correspond to an area of said object pattern expanded by a predetermined number of pixels for defining said plurality of said master pattern areas, each of said master pattern areas being two-dimensionally misregistered pixel-by-pixel by prescribed different amounts over the expanded area; and

comparing the digitized signals of said master pattern areas with the digitized signals of said unit area of said object pattern corresponding to said master pattern areas to perform defect detection by;

(a) while scanning defect inspection windows, sized to contain a plurality of pixels, over said unit area of said object pattern and said master pattern areas, comparing each one of said plurality of master pattern areas with said unit area of said object pattern to determine for each pair-wise comparison that said patterns are mismatched when all digitized signals representing corresponding pixels included in said windows are mismatched in any scanning position;

(b) determining that said object pattern is defective when said object pattern area is determined to be mismatched with respect to each one of said plurality of master pattern areas; and

(c) determining that said object pattern is not defective when said object pattern area is determined not to be mismatched with respect to at least one of said master pattern areas.

2. A method of detecting pattern defects in accordance with claim 1, wherein the step of comparing the digitized signals of said area of said two-dimensional object pattern with digitized signals of each of said two-dimensional master pattern areas is performed in parallel with a plurality of areas of a prescribed size arranged in the main scanning direction.

3. An apparatus for detecting pattern defects by comparing a two-dimensional object pattern with a two-dimensional master pattern for each unit area of a prescribed size, said apparatus comprising:

means for inputting digitized signals of said object pattern in a sequential manner;

means for reading digitized signals of said master pattern in a sequential manner from a memory synchronously with said inputted digitized signals of said object pattern;

first extraction means for extracting digitized signals in a specific area of said object pattern in a sequential manner along the scanning direction synchronously with said inputted digitized signals of said object pattern;

second extraction means for defining an expanded area by expanding the periphery of a specific area of said master pattern by a required number of pixels to positionally correspond to said specific area whose digitized signals are extracted by said first extraction means and extracting from said memory, in a sequential manner along the scanning direction, digitized signals in a plurality of specific areas of said master pattern which are two-dimensionally misregistered pixel by pixel by prescribed different amounts over said expanded area;

a plurality of comparison/decision means for sequentially pair-wise comparing said digitized signals from prescribed size window areas in said specific area of said object pattern extracted by said first extraction means with said digitized signals from corresponding window areas of said prescribed size in each of said specific areas of said master pattern extracted by said second extraction means to provide and store a mismatch result when all of said digitized signals of corresponding pixels in said pair of specific areas are mismatched in at least one portion in any scanning position; and

first decision means for determining that said prescribed size area of said object pattern is defective when all of said comparison/decision means hold mismatch results and for determining that said prescribed size area of said object pattern is not defective when at least one of said comparison/decision means does not hold a mismatch result.

4. An apparatus for detecting pattern defects in accordance with claim 3, wherein

said comparison/decision means includes:

means for comparing said digitized signals from said area of said two-dimensional object pattern with digitized signals from each of said two-dimensional master pattern areas in parallel with respect to a plurality of areas of prescribed size arranged in the main scanning direction.

5. An apparatus for detecting pattern defects in accordance with claim 3, wherein

said comparison/decision means includes:

comparison means for comparing match and mismatch of digitized signals in said specific area of said object pattern extracted by said first extraction means with said digitized signals in said specific areas of said master pattern extracted by said second extraction means by matching corresponding pixels;

second decision means for determining that said patterns are mismatched when all of the results of comparison of said corresponding pixels by said comparison means are mismatched; and

holding means for holding pattern mismatch results in a pattern scanning interval when there is at least one pattern mismatch decision result by said second decision means.

6. An apparatus for detecting pattern defects in accordance with claim 5, wherein

said comparison/decision means include:

means for making mismatch decisions on the bases of results of comparisons which extract only specific pixels corresponding to various defective patterns from the results of respective comparison of all pixels in said specific areas by said comparison means, and

means for selecting any one decision result within the results of decision of said various defective patterns made by said means for making mismatch decisions to for outputting the selected result to said holding means.

7. An apparatus for detecting pattern defects in accordance with claim 5, wherein

each said comparison means comprises a plurality of exclusive OR circuits receiving at respective first input terminals thereof digitized signals of respective pixels included in said specific area of said object patterns and receiving at respective second input terminals thereof digitized signals of respective pixels included in said specific areas of said master pattern,

each said decision means comprises a first AND circuit receiving all of output signals from said plurality of exclusive OR circuits, and

each said holding means comprises an OR circuit receiving output signals from said first AND circuit in one input terminal thereof and a D-type flip-flop receiving output signals from said OR circuit and having an output terminal arranged for supplying output signals thereof to another input terminal of said OR circuit.

8. An apparatus for detecting pattern defects in accordance with claim 3, wherein

said first extraction means includes a plurality of first shift registers for sequentially delaying said digitized signals of said object pattern by one scanning operation, and

said second extraction means includes a plurality of second shift registers for sequentially delaying said digitized signals of said master pattern by one scanning operation.

9. An apparatus for detecting pattern defects in accordance with claim 3, wherein

said first decision means includes AND circuit means receiving output signals from respective ones of said comparison/decision means.

10. An apparatus for detecting pattern defects as recited in claim 3 wherein said plurality of comparison/decision means are arranged in an array of comparison/detection blocks,

each of said blocks having first and second sets of inputs,

said first set of inputs of each said block connected to receive said digitized signals representing said specific area of said object pattern from said first extraction means, and

said second set of inputs of each said block connected for receiving said digitized signals representing said plurality of areas of said master pattern from said second extraction means.

11. An apparatus for detecting pattern defects in accordance with claim 10 wherein said array of comparison/detection blocks is arranged as a plurality of sub-arrays,

said second extraction means comprising a plurality of shift registers arranged in a sequence wherein each register provides an output to a next register in the sequence, each said shift register also providing an output to at least one sub-array of said comparison/detection blocks, each sub-array receiving on the second set of inputs of said comparison/detection blocks thereof inputs from a predetermined set of said shift registers,

further including progressive delays between said predetermined set of shift registers and said second set of inputs of successive comparison/detection blocks of said sub-array.

12. An apparatus for detecting pattern defects in accordance with claim 10 wherein each of said comparison/detection blocks receives as said first set of inputs a set of digitized signals corresponding to a matrix of pixels representing said specific area of said object pattern and receives as said second set of inputs digitized signals corresponding to a matrix of pixels representing said specific areas of said master pattern,

each of said comparison/detection blocks connected for receiving as said second set of inputs a matrix of pixels representing one of said plurality of specific areas of said master pattern displaced by a predetermined number of scan lines in one direction and by a predetermined number of pixels in another direction from the matrix of pixels received by the second set of inputs of each other comparison/detection block.

13. An apparatus for detecting pattern defects in accordance with claim 10 wherein each said comparison/detection block comprises comparison circuit means receiving said first and second sets of inputs, said comparison circuit means operable for comparing corresponding pixels inputted on said first and second sets of inputs and for storing results of said comparison,

decision circuit means receiving said results of said comparison from said comparison circuit means for providing an output signal indicative of a mismatch for each of said corresponding pixels, and

holding circuit means including a sequentially operating circuit, said sequentially operating circuit receiving an output from said decision circuit means and providing an output signal indicative of determination that at least one of said sets of pixel matrices compared by said comparison circuit means are mismatched as outputted by said decision circuit means.

14. An apparatus for detecting pattern defects in accordance with claim 13, wherein said comparison circuit means includes a plurality of exclusive OR gate means driving a plurality of respective shift register means,

said decision circuit means comprises AND gate means receiving an input signal from each of said shift register means of said comparison circuit means, and

said holding circuit means comprises flip-flop means having an input driven by an OR gate and an output provided to a further AND gate, said OR gate receiving a first input from said output of said flip-flop means and a second input from an output of said decision circuit means.