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Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems

DC
  • US 4,805,123 A
  • Filed: 07/14/1986
  • Issued: 02/14/1989
  • Est. Priority Date: 07/14/1986
  • Status: Expired due to Term
First Claim
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1. A method of detecting defects in objects such as photomasks, reticles, wafers, printed circuit boards, and the like, comprising the steps of:

  • inspecting a selected surface area of an object and generating a first stream of data having signal values representing the image content of each pixel thereof;

    generating a second stream of data having signal values representing the image content of each pixel of said second stream of data;

    storing corresponding portions of the first and second streams of data in memory;

    detecting with a resolution to a fraction of a pixel any misalignment between the stored portions of said first and second streams of data;

    aligning the stored first and second portions of data using subpixel interpolation to correct any detected misalignment therebetween; and

    comparing corresponding subportions of the stored and aligned first and second portions of data to detect differences therebetween, and upon detecting a difference, indicating the presence of a defect at a particular pixel location on the inspected object.

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