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Method of making low emissivity film for high temperature processing

  • US 4,806,220 A
  • Filed: 12/29/1986
  • Issued: 02/21/1989
  • Est. Priority Date: 12/29/1986
  • Status: Expired due to Term
First Claim
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1. A method for making a high transmittance, high-temperature resistant film comprising the steps of:

  • a. sputtering a metal cathode target in a reactive atmosphere comprising oxygen thereby depositing a first metal oxide film on a surface of a substrate;

    b. sputtering a metal-containing primer layer over said metal oxide layer;

    c. sputtering a reflective metallic film over said metal-containing primer layer;

    d. sputtering a second metal-containing primer layer over said reflective metallic film;

    e. sputtering a second metal oxide film over said second primer layer thereby producing a coated article with a visible transmittance lower than the desired visible transmittance of the final product; and

    f. heating said coated article to a sufficient temperature for a sufficient time to increase the visible transmittance of said high-temperature resistant film.

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