Method of making low emissivity film for high temperature processing
First Claim
Patent Images
1. A method for making a high transmittance, high-temperature resistant film comprising the steps of:
- a. sputtering a metal cathode target in a reactive atmosphere comprising oxygen thereby depositing a first metal oxide film on a surface of a substrate;
b. sputtering a metal-containing primer layer over said metal oxide layer;
c. sputtering a reflective metallic film over said metal-containing primer layer;
d. sputtering a second metal-containing primer layer over said reflective metallic film;
e. sputtering a second metal oxide film over said second primer layer thereby producing a coated article with a visible transmittance lower than the desired visible transmittance of the final product; and
f. heating said coated article to a sufficient temperature for a sufficient time to increase the visible transmittance of said high-temperature resistant film.
3 Assignments
0 Petitions
Accused Products
Abstract
A multiple-layer, high transmittance, low emissivity coated article which can be subjected to high temperature processing such as bending, annealing, tempering, laminating or glass welding as a result of titanium-containing primer layers is disclosed.
350 Citations
9 Claims
-
1. A method for making a high transmittance, high-temperature resistant film comprising the steps of:
-
a. sputtering a metal cathode target in a reactive atmosphere comprising oxygen thereby depositing a first metal oxide film on a surface of a substrate; b. sputtering a metal-containing primer layer over said metal oxide layer; c. sputtering a reflective metallic film over said metal-containing primer layer; d. sputtering a second metal-containing primer layer over said reflective metallic film; e. sputtering a second metal oxide film over said second primer layer thereby producing a coated article with a visible transmittance lower than the desired visible transmittance of the final product; and f. heating said coated article to a sufficient temperature for a sufficient time to increase the visible transmittance of said high-temperature resistant film. - View Dependent Claims (2, 3, 4, 5)
-
-
6. A method for making a multiple layer low emissivity coated product comprising the steps of:
-
a. placing a transparent, nonmetallic substrate in a sputtering chamber; b. sputtering a cathode target comprising zinc and tin in a reactive atmosphere comprising oxygen to deposit a first transparent zinc/tin oxide film on a surface of said substrate; c. sputtering a titanium target to deposit a primer layer on said oxide film; d. sputtering a silver cathode target in an inert atmosphere to deposit a transparent silver film on said primer layer; e. sputtering a titanium target to deposit a second primer layer on said silver film; f. sputtering a cathode target comprising zinc and tin in a reactive atmosphere comprising oxygen to deposit a second zinc/tin oxide film on said second primer layer;
thereby producing a coated article with a visible transmittance lower than the desired visible transmittance of the coated article; andg. heating said coated article at a sufficient temperature for a sufficient time to increase the visible transmittance of said low emissivity coated product. - View Dependent Claims (7, 8, 9)
-
Specification