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Method of producing thin-film storage disk

  • US 4,816,127 A
  • Filed: 12/27/1985
  • Issued: 03/28/1989
  • Est. Priority Date: 11/15/1984
  • Status: Expired due to Fees
First Claim
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1. A method of producing a magnetic disk having a substantially isotropic, uniform-thickness magnetic film, said method comprisingplacing a planar circular substrate on a pallet for movement, linearly and without rotation, along a path through a sputtering chamber having a first target adapted to sputter a crystalline underlayer onto the substrate, and a second, downstream, target adapted to sputter the magnetic film onto the underlayer,moving the substrate through a first region underlying the first target, under shielding conditions provided by a fixed-position baffle which (a) limit deposition of sputtered material onto the substrate to substrate regions which substantially underlie the target and (b) provide substantially symmetrical, substantially unhindered side-to-side deposition onto the substrate, andmoving the substrate through a second region underlying the second target under shielding conditions provided by a fixed-position baffle which (a) provide substantially symmetrical, substantially unhindered side-to-side deposition onto the substrate, and (b) provide less shielding between the target and substrate, on progressing radially outwardly away from a center region of the substrate paralleling the path of travel, toward opposite side regions of the substrate.

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