Wafer processing apparatus
First Claim
1. An apparatus for processing wafers comprising:
- (a) a vacuum processing chamber;
(b) a source of radiant energy; and
(c) a reflector which radiatively couples said source of radiant energy to the wafer in a wafer support.
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Accused Products
Abstract
A processing apparatus and method for rapid thermal processing wherein the radiant heat source is dynamically reconfigurable to change the heating distribution across the radii of the wafer. Since the radiative and conductive heat flow paths from parts of the wafer near the center are different from the heat flow paths for the parts of the wafer near the edge, the loadings will change dynamically as the wafer is heated and cooled. This temperature dependence in the relative couplings across the wafer makes it very difficult to maintain a flat temperature profile during heatup and cooldown, and failure to maintain a flat temperature profile can cause wafer damage (especially wafer warpage). The present application describes a processing apparatus and method which changes the distribution dynamically, so that a higher fraction of the total power is provided to the wafer edge regions after the wafer is at high temperature. This can be done by using (as a radiant heat source) a lamp module wherein the central portion of the lamp reflector module is mechanically moved in and out to change the center to edge distribution of heating power.
64 Citations
21 Claims
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1. An apparatus for processing wafers comprising:
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(a) a vacuum processing chamber; (b) a source of radiant energy; and (c) a reflector which radiatively couples said source of radiant energy to the wafer in a wafer support. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 19)
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17. An apparatus for processing wafers comprising:
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(a) a vacuum process chamber (b) a source of radiant energy; and (c) a reflector thermally coupled to tranfer energy from said source of radiant energy and to a wafer and having an alterable shape to redistribut said radiant energy in response to a control signal. - View Dependent Claims (18)
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20. An apparatus for processing a workpiece, comprising;
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(a) a process chamber; and (b) a source of radiant energy coupled to the workpiece capable of altering the shape of a radiant energy distribution in response to a control signal. - View Dependent Claims (21)
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Specification