Apertured ring for exhausting plasma reactor gases
First Claim
1. Apparatus adapted for use with a plasma reactor of the type having a reaction chamber for dispensing a gas, and a semiconductor slice holder for subjecting a semiconductor slice to the gas, comprising:
- a ring having an outside dimension for engaging a sidewall of the reaction chamber, an inside dimension defining a central opening aperture for receiving therein and laterally confining the semiconductor slice.
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Accused Products
Abstract
An annular ring (38) adapted for use in a plasma reaction chamber. The annular ring (38) includes a central opening aperture for laterally retaining a semiconductor slice (40) within the chamber. Spaced around the ring are a plurality of gas exhaust ports (58) for providing a back pressure within the chamber, for removing gases therefrom. Different rings can be provided with different central opening apertures to accommodate the processing of different sized slices. Alternative arrangements of the ring (38) provide for mask openings (68) to mask selected areas of the slice (40) and prevent plasma reactions thereat.
77 Citations
18 Claims
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1. Apparatus adapted for use with a plasma reactor of the type having a reaction chamber for dispensing a gas, and a semiconductor slice holder for subjecting a semiconductor slice to the gas, comprising:
a ring having an outside dimension for engaging a sidewall of the reaction chamber, an inside dimension defining a central opening aperture for receiving therein and laterally confining the semiconductor slice. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. Apparatus for use with a plasma reactor of the type for processing semiconductor slices, comprising:
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a reaction chamber for generating a plasma reaction; an inlet for inputting a gas into said chamber; a support ring for laterally supporting a slice within said chamber, said ring having a plurality of ports for exhausting the gas from said chamber at a plane above said slice, said ports being sized to produce a back pressure in said chamber to thereby enhance uniformity of material deposition as a result of said plasma reaction. - View Dependent Claims (12, 13, 14, 15)
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16. Apparatus adapted for use with a plasma reactor of the type having a reaction chamber for dispensing a gas, and a semiconductor slice holder for subjecting a semiconductor slice to the gas, comprising:
an electrically insulating ring providing a space between the slice and a sidewall of said chamber, said ring having a plurality of exhaust ports spaced therearound for exhausting gas from an area above said slice to the outside of said chamber. - View Dependent Claims (17, 18)
Specification