Dual glass contact process

• US 4,824,767 A
• Filed: 06/02/1987
• Issued: 04/25/1989
• Est. Priority Date: 01/09/1986
• Status: Expired due to Term

• Current Assignee: Intel Corporation
• Original Assignee: Intel Corporation
• Inventors: Chambers, Stephen T., Luce, Stephen T.
• Primary Examiner(s): Dees, Jose G.
• Application Number:
  US07/057,240
• Time in Patent Office: 693 Days
• Field of Search: 430/313, 430/316, 430/317, 430/323, 430/327, 430/330, 430/329, 430/314, 156/643, 156/653, 437/189, 437/229
• US Class Current: 430/313
• CPC Class Codes: H01L 21/3105 After-treatment
• CPC Class Codes: H01L 21/76804 by forming tapered via holes

Abstract

A method for forming contact openings in semiconductor devices. In borosilicate glass layers deposited over the gate and drain area of a device, followed by a borophosphosilicate glass layer. After masking with photoresist and defining openings, the borophosphosilicate glass is isotropically etched to undercut the resist layer. A plasma etch is utilized to anisotropically etch the borosilicate glass layer and expose the surface of the drain area. After the photoresist is stripped away, a reflow step is employed to reduce the sharp edges of the glass layer and result in a sloped contact opening profile. Good metal coverage is achieved while maintaining isolation of the gate.

Claims

1. An improved method of providing insulated contact openings having sloped two step profiles on a semiconductor body comprising the steps of:

forming a first dielectric layer on said body, said first dielectric layer having a first reflow temperature, said first dielectric layer being permeable to hydrogen;

forming a second dielectric layer on said first dielectric layer, said second dielectric layer having a second reflow temperature lower than said first reflow temperature;

heating said body to said second reflow temperature;

forming a photoresist layer on said second dielectric layer and forming openings in said photoresist layer to expose portions of said second dielectric layer utilizing a photolithographic means;

removing said exposed portions of said second dielectric layer to expose portions of said first dielectric layer by an isotropic etching process;

removing said exposed portions of said first dielectric layer to expose portions of said body by an anisotropic etching process;

removing said photoresist layer;

heating said body to said second reflow temperature;

whereby an improved insulated contact opening having a sloped, two step profile is realized.

2. The method as defined by claim 1 wherein said first dielectric layer is borosilicate glass.

3. The method as defined by claim 1 wherein said second layer comprises borophosphosilicate glass.

4. The method as defined by claim 1 wherein said second reflow temperature is approximately 920°

C.

5. A method of forming contacts on a semiconductor body, where the contacts are embedded in contact openings having sloped two step profiles, comprising the steps of:

forming a first dielectric layer on said body, said first dielectric layer having a first reflow temperature and a first etch rate, said first dielectric layer being permeable to hydrogen;

forming a second dielectric layer on said first dielectric layer, said second dielectric layer having a second reflow temperature and a second etch rate, said second reflow temperature lower than said first reflow temperature, said second etch rate higher than said first etch rate;

heating said body to said second reflow temperature;

forming a photoresist mask layer on said second dielectric layer;

defining openings in said mask layer to expose said second dielectric layer utilizing a photolithographic means;

removing said exposed portions of said second dielectric layer to expose said first dielectric layer by an isotropic etching process;

removing said exposed portions of said first dielectric layer to expose said body by an anisotropic etching process;

removing said mask layer;

heating said body to said second reflow temperature;

forming a conductive layer on said exposed portions of said body;

whereby an improved contact is realized.

6. The method as defined by claim 5 wherein said first dielectric layer comprises borosilicate glass.

7. The method as defined by claim 5 wherein said second dielectric layer comprises borophosphosilicate glass.

8. The method as defined by claim 5 wherein said second reflow temperature is approximately 920°

C.

9. The method as defined by claim 5 wherein said second dielectric layer is removed by a wet etch.

10. The method as defined by claim 5 wherein said first dielectric layer is removed by a plasma etch.

11. The method as defined by claim 5 wherein said first and second dielectric layer are permeable by hydrogen.

12. The method as defined by claim 5 wherein said conductive layer is comprised of metal.

13. A method for forming contacts on a semiconductor body having a thermal oxide layer formed thereon, the contacts embedded in a contact opening having a sloped two step profile, said method comprising the steps of:

forming a first dielectric layer on said thermal oxide layer, said first dielectric layer having a first reflow temperature and a first etch rate;

forming a second dielectric layer on said first dielectric layer, said second dielectric layer having a second reflow temperature and a second etch rate, said second reflow temperature lower than said first reflow temperature, said second etch rate higher than said first etch rate;

heating said body to said second reflow temperature;

forming a photoresist mask layer on said second dielectric layer;

defining openings in said mask layer to expose said second dielectric layer utilizing a photolithographic means;

removing said exposed portions of said second dielectric layer to expose said first dielectric layer by an isotropic etching process;

removing said exposed portions of said first dielectric layer to expose said body to an anisotropic etching process;

removing said mask layer;

heating said body to said second reflux temperature;

forming a conductive layer on said exposed portions of said body;

whereby an improved contact is realized.

14. The method as defined by claim 13 wherein said first dielectric layer comprises borosilicate glass.

15. The method as described by claim 13 wherein said second dielectric layer comprises borophosphosiliate glass.

16. A method of forming contacts on a semiconductor body, having a layer of thermal oxide formed thereon, said method comprises the steps of:

forming a first glass layer on said body, said first glass layer comprises borosilicate glass;

forming a second glass layer on said first glass layer, said second glass layer comprising borophosphosilicate glass;

heating said body to a temperature at which said second glass layer will reflow;

forming a photoresist mask layer on said second glass layer;

defining openings in said mask layer to expose said second glass layer utilizing a photolithographic means;

removing said exposed portions of said second glass layer to expose said first glass layer by an isotropic etching process;

removing said exposed portions of said first glass layer and portions of said thermal oxide layer underlying said exposed portions of said first glass layer to expose said body by an anisotropic etching process;

removing said mask layer;

heating said body to said reflow temperature of said second glass layer;

forming a conductive layer on said exposed portions of said body;

whereby the improved contact is utilized.