Wafer inspecting apparatus

• US 4,856,904 A
• Filed: 02/10/1988
• Issued: 08/15/1989
• Est. Priority Date: 01/21/1985
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Akagawa, Masayuki
• Primary Examiner(s): EVANS, FANNIE L
• Application Number:
  US07/157,128
• Time in Patent Office: 552 Days
• Field of Search: 356/399, 356/400, 356/401, 356/237, 364/492, 364/551, 364/559, 324/158 F, 250/491.1, 250/548, 250/557, 414/222, 414/225
• US Class Current: 356/400
• CPC Class Codes: H01L 21/681 using optical controlling means
• CPC Class Codes: Y10S 414/137 including means for charging or discharging wafer cassette
• CPC Class Codes: Y10S 414/138 Wafers positioned vertically within cassette

Abstract

Semiconductor wafer inspecting apparatus comprises plural supports each adapted to support a wafer to be inspected and a feeder for feeding a wafer to each of the plural supports. The apparatus can effect accurate and rapid positioning of the wafer.

Claims

1. Apparatus comprising:

(a) inspection means for inspecting a wafer, said inspection means having support means for supporting said wafer while the wafer is inspected;

(b) transport means for transporting said wafer to said support means;

(c) scanning means for scanning said wafer photoelectrically and for generating output signals during said transporting of said wafer by said transport means; and

(d) alignment means for aligning said wafer with respect to said apparatus in response to said output signals generated by said scanning means during said transporting of said wafer by said transport means.

2. Apparatus according to claim 1, wherein said scanning means comprises a linear image sensor.

3. Apparatus according to claim 2, wherein said image sensor comprises a plurality of photoelectric conversion elements disposed along a line.

4. Apparatus according to claim 1, wherein said transport means transports said wafer from a first position to a second position along a predetermined path, and wherein said scanning means detects a light intensity distribution at a predetermined region that extends substantially perpendicular to said path.

5. Apparatus according to claim 4, wherein said alignment means aligns said wafer with respect to said apparatus after the wafer has been transported to said second position by the transport means.

6. Apparatus according to claim 4, wherein said transport means has means for mounting the wafer thereon, wherein said apparatus includes means for determining the orientation of an orientation flat of the wafer mounted on the mounting means based on output signals from said scanning means, and wherein said alignment means rotates the wafer in accordance with the orientation determined by said determining means.

7. Apparatus according to claim 6, wherein said apparatus includes another mounting means located at said second position, wherein said determining means also determines the position of the center of the wafer on the first-mentioned mounting means, and wherein said transport means mounts the wafer on said another mounting means based on the determining of the position of the center of the wafer so that the center of the wafer is substantially coincident with a predetermined position of said another mounting means.

8. Apparatus according to claim 4, wherein said scanning means is formed so that the length of said predetermined region is greater than a corresponding dimension of said wafer.

9. Apparatus comprising:

(a) support means for supporting a wafer;

(b) transport means for transporting said wafer to said support means;

(c) scanning means for scanning said wafer photoelectrically and for generating output signals during said transporting of said wafer by said transport means; and

(d) alignment means for aligning said wafer with respect to said apparatus in response to said output signals generated by said scanning means during said transporting of said wafer by said transport means.

10. Apparatus comprising:

(a) operating means having support means for supporting a substrate;

(b) transporting means for transporting said substrate to said support means in order to permit said operating means to operate upon said substrate;

(c) scanning means for scanning said substrate photoelectrically and for generating output signals during said transporting of said substrate by said transport means; and

(d) alignment means for causing said support means to align said substrate supported by said support means with respect to said operating means in response to said output signals operated by said scanning means during said transporting of said substrate by said transport means;

said operating means operating upon said substrate in response to the completion of said aligning by said alignment means.

11. Apparatus according to claim 10, wherein said scanning means comprises a linear image sensor.

12. Apparatus according to claim 11, wherein said linear image sensor has a light receiving surface which is extended along a predetermined direction, and wherein the length of said light receiving surface along said predetermined direction is greater than a corresponding dimension of said substrate.

13. Apparatus comprising:

(a) operating means having means for supporting a substrate;

(b) transport means for transporting said substrate from a predetermined position to said support means in order to permit said operating means to operate upon said substrate;

(c) light detecting means for detecting light intensity distribution on a predetermined region which is positioned between said predetermined position and said support means, said light detecting means generating output signals indicative of light intensity distribution of said predetermined region; and

(d) alignment means for causing said support means to align said substrate supported by said support means with respect to said operating means in response to said output signals which are generated by said light detecting means during said transporting of said substrate by said transport means;

said operating means operating upon said substrate in response to the completion of said aligning by said alignment means.

14. Apparatus according to claim 13, wherein said light detecting means is formed so that the length of said predetermined region is greater than a corresponding dimension of said substrate.