Reactor monitoring system and method

• US 4,857,136 A
• Filed: 06/23/1988
• Issued: 08/15/1989
• Est. Priority Date: 06/23/1988
• Status: Expired due to Fees

• Current Assignee: Zajac, John
• Original Assignee: Zajac, John
• Inventors: Zajac, John
• Primary Examiner(s): Powell, William A.
• Application Number:
  US07/210,650
• Time in Patent Office: 418 Days
• Field of Search: 156/626, 156/627, 156/643, 156/646, 156/345, 204/192.13, 204/192.33, 204/298, 427/8, 427/38, 427/39, 118/712-715, 118/50.1, 118/620, 356/357,437
• US Class Current: 438/16
• CPC Class Codes: C23C 16/4412 Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: C30B 25/165 the flow of the reactive gases
• CPC Class Codes: G01N 21/69 specially adapted for fluids , e.g. molten metal
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring

Abstract

System and method for detecting problems and other conditions in a semiconducting processing reactor. The relative amounts of two or more substances are monitored, and an output signal is provided when the relative amounts change in a manner corresponding to the change or condition to be detected. In one disclosed embodiment, the substances are ionized to produce excited molecules of the substances, and the substances are sensed with photosensors which are responsive to light of wavelengths characteristic of the substances.

Claims

1. In a system for detecting a change in the operating conditions in a semiconductor processing reactor:

sensor means responsive to two different substances for providing signals corresponding to the amounts of the substances which are present, and means responsive to the sensor signals for monitoring the relative amounts of the two substances and providing an output signal when the relative amounts change in a predetermined manner.

2. The system of claim 1 wherein the sensor means comprises first and second photosensors responsive to light of wavelengths characteristic of the two substances.

3. The system of claim 1 wherein the means responsive to the sensor signals includes means for monitoring the ratio of the sensor signals.

4. In a system for detecting the end of a process in a reactor:

sensing means for detecting the presence of two different substances, means responsive to the sensing means for monitoring the relative amounts of the two substances, and means responsive to the monitoring means for providing an output signal when the relative amounts of the two substances change in a predetermined manner.

5. The system of claim 4 wherein the sensing means comprises a pair of photosensors responsive to light of different wavelengths characteristic of the two substances.

6. The system of claim 4 including means for ionizing the two substances to produce excited molecules which are detected by the sensing means.

7. In combination:

a semiconductor processing reactor, sensor means responsive to two different substances for providing signals corresponding to the amounts of the substances which are present in the reactor, means responsive to the sensor signals for monitoring the relative amounts of the two substances, and means responsive to the relative amounts for providing an output signal.

8. The combination of claim 7 wherein the reactor is a plasma reactor with an exhaust system, and the means sensor means monitors gases in the exhaust system.

9. The combination of claim 8 including means for ionizing the gases in the exhaust system to produce excited molecules of the two substances which are detected by the sensing means.

10. The combination of claim 9 wherein the sensor means comprises first and second photosensors which are responsive to different wavelengths of light emitted by the excited molecules of the two substances.

11. In a method of detecting a change in the operating conditions in a semiconductor processing reactor:

monitoring the relative amounts of two substances which are present in the reactor, and providing an output signal when the relative amounts change in a predetermined manner.

12. The method of claim 11 wherein the relative amounts are monitored by sensing light at wavelengths characteristic of the two substances, and taking the ratio of the amounts of light sensed at the respective wavelengths.

13. The method of claim 12 including the step of ionizing the substances to produce excited molecules which emit the light at the characteristic wavelengths.

14. In a method of detecting the end of a process in a reactor:

detecting the presence of two different substances in the reactor, monitoring the relative amounts of the two substances, and providing an output signal when the relative amounts of the two substances change in a predetermined manner.

15. The method of claim 14 wherein the presence of the two substances is detected by sensing light at wavelengths characteristic of the two substances.

16. The method of claim 15 including means for ionizing the two substances to produce excited molecules which emit the light at the characteristic wavelengths.