End-Hall ion source

• US 4,862,032 A
• Filed: 10/20/1986
• Issued: 08/29/1989
• Est. Priority Date: 10/20/1986
• Status: Expired due to Term

• Current Assignee: Kaufman & Robinson, Inc.
• Original Assignee: Kaufman, Harold R., Raymond S. Robinson
• Inventors: Kaufman, Harold R., Robinson, Raymond S.
• Primary Examiner(s): Moore, David K.
• Assistant Examiner(s): Powell, Mark R.
• Application Number:
  US06/920,798
• Time in Patent Office: 1,044 Days
• Field of Search: 315/111.41, 315/111.51, 315/111.61, 315/111.81, 313/231.31, 313/231.41, 313/111.9, 313/161, 250/427, 60/202, 60/208
• US Class Current: 313/359.1
• CPC Class Codes: H01J 27/02 Ion sources; Ion guns for examination or processing discharge tubes H01J37/08; ion sources, ion guns for particle spectrometer or separator tubes H01J49/10; ion propulsion F03H1/00
• CPC Class Codes: H01J 27/146 End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder

Abstract

A gas, ionizable to produce a plasma, is introduced into a region defined within an ion source. An anode is disposed near one end of that region, and a cathode is located near the other. A potential is impressed between the anode and the cathode to produce electrons which flow generally in a direction from the cathode toward the anode and bombard the gas to create a plasma. A magnetic field is established within the region in a manner such that the field strength decreases in the direction from the anode to the cathode. The direction of the field is generally between the anode and the cathode. The electrons are produced independently of any ion bombardment of the cathode, the magnet is located outside the region on the other side of the anode and the gas is introduced uniformly across the region.

Claims

1. An ion source comprising:

means for introducing and distributing a gas, ionizable to produce a plasma, uniformly in a transverse direction across a region within said source;

an anode disposed within said source near one longitudinal end of said region;

a cathode disposed near the other longitudinal end of said region and spaced from said anode;

means for impressing a potential difference between said anode and said cathode to produce electrons flowing generally in a longitudinal direction from said cathode toward said anode in bombardment of said gas to create said plasma, the production of said electrons being independent of any substantial bombardment of said cathode by ions in said plasma;

and means included within said source for establishing within said region a magnetic field the strength of which decreases in the direction from said anode to said cathode and the direction of which field is generally between said anode and said cathode, said establishing means including a magnet located entirely outside of and on the side of said anode away from said region in said longitudinal direction.

2. An ion source comprising:

means for introducing a gas, ionizable to produce a plasma, into a region within said source;

an anode disposed within said source near one end of said region;

a cathode disposed near the other end of said region and spaced from said anode;

means for impressing a potential difference between said anode and said cathode to produce electrons flowing generally in a direction from said cathode toward said anode in bombardment of said gas to create said plasma, the production of said electrons being substantially independent of any bombardment of said cathode by ions in said plasma;

and means included within said source for establishing within said region a magnetic field the strength of which continually decreases in the direction from said anode to said cathode and the direction of which field is generally between said anode and said cathode.

5. An ion source as defined in claims 2, 3 or 4 in which said establishing means includes a ferromagnetic material, having a permeability substantially greater than unity, to shape and control the distribution of strength within said magnetic field, and in which said ferromagnetic material, completing the magnetic flux return path outside of said region, exhibits a relative permeability of at least approximately two orders of magnitude greater than unity.

6. An ion source as defined in claims 2, 3 or 4 wherein said establishing means includes at least one element which is electrically isolated from said anode and said cathode.

7. An ion source as defined in claims 2, 3 or 4 in which said establishing means establishes a plasma potential that varies laterally of the path between said anode and said cathode but a fraction of and substantially less than the plasma potential difference between the vicinity of said cathode and the vicinity of said anode, said lateral variation of plasma potential serving to control focusing or defocusing of the ion beam.

8. An ion source as defined in claims 2, 3 or 4 in which said anode is generally cylindrical in shape with an interior wall which tapers outwardly in a direction toward said cathode.

9. An ion source as defined in claims 2, 3 or 4 in which said establishing means includes a first annular pole piece disposed on the side of said anode away from said region and adjacent to and axially aligned with said anode and a second annular pole piece spaced from said first pole piece toward said cathode and axially aligned with said anode.

10. An ion source as defined in claim 9 in which said anode is generally cylindrical in shape, and in which the interior of said second pole piece is disposed to be outside a projection of the interior wall of said anode toward said cathode.

11. An ion source as defined in claim 2, 3 or 4 in which said establishing means further includes means for distributing said field through said region.

12. An ion source as defined in claims 2 or 4 in which said establishing means includes means for developing said field and which is located on the side of said anode remote from said cathode.

13. An ion source as defined in claim 2 in which said cathode is electrically heated by an external power source and is located downstream in the flow of ions created within said plasma and at a location wherein the strength of said magnetic field is low relative to the strength of said field elsewhere within said region.

21. An ion source as defined in claim 2, 3, or 4 in which the potential difference V_p along the direction between said anode and said cathode is expressed substantially in accordance with the relationship

3. An ion source comprising:

means for introducing a gas, ionizable to produce a plasma, into a region within said source;

an anode disposed within said source near one end of said region;

a cathode disposed near the other end of said region and spaced from said anode;

means for impressing a potential between said anode and said cathode to produce electrons flowing generally in a longitudinal direction from said cathode toward said anode in bombardment of said gas to create said plasma;

and means included within said source for establishing within said region a magnetic field the strength of which decreases in the direction from said anode to said cathode and the direction of which field is generally between said anode and said cathode, said establishing means including a magnet located entirely outside of and on the side of said anode away from said region in said longitudinal direction.

4. An ion source comprising:

means for introducing and distributing a gas, ionizable to produce a plasma, uniformly in a transverse direction across a region within said source;

an anode disposed within said source near one longitudinal end of said region;

a cathode disposed near the other longitudinal end of said region and spaced from said anode;

means for impressing a potential between said anode and said cathode to produce electrons flowing generally in a longitudinal direction from said cathode toward said anode in bombardment of said gas to create said plasma;

and means included within said source for establishing within said region a magnetic field the strength of which decreases in the direction from said anode to said cathode and the direction of which field is generally between said anode and said cathode.

14. An ion source as defined in claim 4 in which said introducing means includes means for controlling the distribution of said gas in order to control the density of said plasma downstream from said anode in the direction of ion flow and thereby control the anode-cathode potential difference.

15. An ion source as defined in claim 4 in which said introducing and distributing means includes means for distributing said gas substantially uniformly in passage through the portion of said region significantly and directly influenced by said anode.

16. An ion source as defined in claim 4 which further includes means for introducing a portion of said gas into said region between said cathode and said anode.

17. An ion source as defined in claim 4 in which said introducing means is electrically isolated from said anode and said cathode.

18. An ion source as defined in claim 4 in which said anode is cylindrical in shape and said gas is introduced into said region through said anode from the end of said anode remote from said cathode.

19. An ion source as defined in claim 18 in which said establishing means includes a first annular pole piece disposed on the side of said anode away from said region and adjacent to and axially aligned with said anode and a second annular pole piece spaced from said first pole piece toward said cathode and axially aligned with said anode.

20. An ion source as defined in claim 4 in which said anode is of cylindrical shape to produce an ion beam of circular cross-sectional shape across its diameter.