Reactive posttreatment for gas separation membranes

• US 4,863,496 A
• Filed: 04/13/1988
• Issued: 09/05/1989
• Est. Priority Date: 04/13/1988
• Status: Expired due to Term

• Current Assignee: L'Air Liquide SA
• Original Assignee: E. I. du Pont de Nemours and Company (Corteva, Inc.)
• Inventors: Hayes, Richard A., Ekiner, Okan M., Manos, Philip
• Primary Examiner(s): Spitzer, Robert
• Application Number:
  US07/175,500
• Time in Patent Office: 510 Days
• Field of Search: 55/16, 55/158
• US Class Current: 427/245
• CPC Class Codes: B01D 67/0088 Physical treatment with compounds, e.g. swelling, coating or impregnation
• CPC Class Codes: B01D 67/0093 Chemical modification
• CPC Class Codes: B01D 69/125 In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction

Abstract

A process for applying and polymerizing a monomeric material to a gas separation membrane to improve the permselectivity of the membrane with respect to at least one pair of gases is disclosed.

Claims

1. A process comprising applying a reactive monomeric material having an atomic weight of less than 1000 to a gas separation membrane and causing said monomeric material to react to form a polymer thereby improving the permselectivity of the membrane with respect to at least two or more gases.

2. The process of claim 1 wherein the monomeric material is an isocyanate having at least two isocyanate groups.

3. The process of claim 2 wherein the isocyanate has two isocyanate groups.

4. The process of claim 3 wherein the isocyanate is aromatic.

5. The process of claim 4 wherein the isocyanate is 2,4-toluene diisocyanate.

6. The process of claim 1 wherein the gas separation membrane is in the form of a hollow fiber.

7. The process of claim 6 wherein the gas separation membrane is formed of an aromatic polyamide.

8. The process of claim 1 wherein the monomeric material is a halosilane having at least two halogen groups.

9. The process of claim 8 wherein the halosilane is an alkyl halosilane.

10. The process of claim 9 wherein the alkylhalosilane is selected from the class consisting of dialkyldihalosilanes, alkyltrihalosilanes or mixtures thereof.

11. The process of claim 10 wherein the dialkyldihalosilane is dialkyldichlorosilane.

12. The process of claim 11 wherein the dialkyldichlorosilane is dimethyldichlorosilane.

13. The process of claim 8 wherein the gas separation membrane is in the form of a hollow fiber.

14. The process of claim 13 wherein the gas separation membrane is formed of an aromatic polyamide.

15. The process of claim 8 wherein the halosilane is aromatic.

16. The process of claim 15 wherein the aromatic halosilane is a diaromatic dihalosilane.

17. The process of claim 16 wherein the diaromatic dihalosilane is diaromatic dichlorosilane.

18. The process of claim 17 wherein the diaromatic dichlorosilane is diphenyl dichlorosilane.

19. The process of claim 15 wherein the gas separation membrane is in the form of a hollow fiber.

20. The process of claim 19 wherein the gas separation membrane is formed of an aromatic polyamide.

21. The process of claim 10 wherein the alkyltrihalosilane is alkyltrichlorosilane.

22. The process of claim 21 wherein the alkyltrichlorosilane is selected from the class consisting of methyltrichlorosilane, octadecyltrichlorosilane or mixtures thereof.

23. The process of claim 21 wherein the gas separation membrane is in the form of a hollow fiber.

24. The process of claim 21 wherein the gas separation membrane is formed of an aromatic polyamide.

25. The process of claim 1 wherein the monomeric material is an acetoxysilane having at least two acetoxy groups.

26. The process of claim 25 wherein the acetoxysilane has 2 or 3 acetoxy groups.

27. The process of claim 26 wherein the acetoxysilane is C₁ to C₁₈ alkyl.

28. The process of claim 27 wherein the alkylacetoxysilane has 3 acetoxy groups.

29. The process of claim 28 wherein the alkyltriacetoxysilane is ethyltriacetoxysilane.

30. The process of claim 25 wherein the gas separation membrane is in the form of a hollow fiber.

31. The process of claim 25 wherein the gas separation membrane is formed of an aromatic polyamide.

32. The process of claim 26 wherein the acetoxysilane is aromatic.

33. The process of claim 32 wherein the aromatic acetoxysilane has 2 acetoxy groups.

34. The process of claim 33 wherein the diaromatic diacetoxysilane is diphenyldiacetoxysilane.

35. The process of claim 32 wherein the gas separation membrane is in the form of a hollow fiber.

36. The process of claim 32 wherein the gas separation membrane is formed of an aromatic polyamide.

37. The process of claim 1 wherein the monomeric material is an alkoxysilane having between two and four alkoxy groups.

38. The process of claim 37 wherein the alkoxysilane is alkyl.

39. The process of claim 38 wherein the alkylalkoxysilane has 2 or 3 alkoxy groups.

40. The process of claim 39 wherein the alkoxy groups are methoxy.

41. The process of claim 40 wherein the alkylmethoxysilane is selected from the class consisting of dimethyldimethoxysilane, methyltrimethoxysilane, ethyltrimethoxysilane, or mixtures thereof.

42. The process of claim 37 wherein the gas separation membrane is in the form of a hollow fiber.

43. The process of claim 37 wherein the gas separation membrane is formed of an aromatic polyamide.