Process for producing glass mold

• US 4,882,827 A
• Filed: 09/15/1988
• Issued: 11/28/1989
• Est. Priority Date: 09/28/1987
• Status: Expired due to Fees

• Current Assignee: Hoya Corporation
• Original Assignee: Hoya Corporation
• Inventors: Uno, Ken, Kusumi, Yasuo, Fujino, Takuo
• Primary Examiner(s): Arbes, Carl J.
• Application Number:
  US07/244,499
• Time in Patent Office: 439 Days
• Field of Search: 29/527.2, 65/374.13, 65/374.15, 65/374.1, 427/34
• US Class Current: 29/527.2
• CPC Class Codes: C03B 11/086 of coated dies use of materials as release or lubricating compositions C03B40/02
• CPC Class Codes: C03B 2215/12 Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
• CPC Class Codes: C03B 2215/24 Carbon, e.g. diamond, graphite, amorphous carbon
• CPC Class Codes: C03B 2215/34 of ceramic or cermet material, e.g. diamond-like carbon
• CPC Class Codes: C03B 40/00 Preventing adhesion between glass and glass or between glass and the means used to shape it , hold it or support it
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/0605 Carbon
• CPC Class Codes: Y10T 29/49982 Coating

Abstract

According to the present process for producing a glass mold, a base for a glass mold to be produced is subjected to a sputtering treatment using an inert gas and graphite as a target at a mold base temperature of 250°-450° C., and thereby is formed on the mold base a hard carbon film having excellent adhesion to the mold base and excellent hardness and being unliable to cause fusion bonding to a molded glass article produced. Accordingly, the glass mold produced according to the present process has excellent durability and excellent glass releasability.

Claims

1. A process for producing a glass mold, said process comprising the steps of:

(a) processing a material for a base having a surface for a glass mold to be produced into a mold base having a shape corresponding to that of a molded glass article to be produced from the mold;

(b) forming a β

-SiC having (111) plane orientation on the surface of the mold base according to a chemical vapor deposition (CVD) method; and

(c) forming a hard carbon film on the mold base according to a sputtering method using an inert gas and graphite as a target at a mold base temperature of 250°

-450°

C.

2. A process according to claim 1, wherein the mold base material is sintered SiC.

3. A process according to claim 1, wherein the inert gas is argon gas.

4. A process according to claim 1, wherein a hard carbon film of different type and different property is obtained by changing an angle formed by the movement direction of carbon atoms sputtered from, the target and the surface of the mold base.

5. A process according to claim 4, wherein sputtered carbon atoms are deposited on the mold base surface at an angle of 40°

-140°

to obtain a hard carbon film consisting of diamond-like and graphite-like ultrafine particles.

6. A process according to claim 4, wherein sputtered carbon atoms are deposited on the mold base surface at an angle of 0°

-40°

or 140°

-180°

to obtain a hard carbon film consisting mainly of graphite.