Accelerometer with integral bidirectional shock protection and controllable viscous damping

• US 4,882,933 A
• Filed: 06/03/1988
• Issued: 11/28/1989
• Est. Priority Date: 06/03/1988
• Status: Expired due to Term

• Current Assignee: NovaSensor, Inc. (General Electric Company)
• Original Assignee: NovaSensor, Inc. (General Electric Company)
• Inventors: Petersen, Kurt E., Barth, Phillip W.
• Primary Examiner(s): NOT, DEFINED
• Assistant Examiner(s): Bell, Robert P.
• Application Number:
  US07/202,081
• Time in Patent Office: 543 Days
• Field of Search: 73/517 R, 73/517 B
• US Class Current: 73/514.13
• CPC Class Codes: G01P 1/003 used for damping
• CPC Class Codes: G01P 15/0802 Details
• CPC Class Codes: G01P 15/12 by alteration of electrical resistance G01P15/0897, G01P15/105 take precedence
• CPC Class Codes: G01P 2015/0828 the mass being of the paddle type being suspended at one of its longitudinal ends

Abstract

A micromachined accelerometer includes integral bidirectional shock protection and controllable viscous damping. The accelerometer includes a frame in which a seismic mass is disposed and coupled to the frame by one or more cantilever beams. Upper and lower stops are provided around the periphery of the seismic mass and around the interior of the frame to limit the travel distance of the seismic mass. The accelerometer is fabricated, preferably from monocrystalline silicon, by defining an annular recess which extends into a first surface of a silicon substrate. Next, a layer is formed over the surface of the substrate but not in contact with the lower surface of the recessed region. An annular-shaped region of the substrate extending from the bottom surface of the substrate to the layer is then removed to define the seismic mass and frame. Finally, portions of the layer are removed to define the cantilever beams and integral bidirectional stops.

Claims

1. A sensing device comprising:

a supporting frame having an opening therein;

a mass disposed in the opening and movable along at least one axis;

a flexure coupled between the frame and the mass;

stop means integral to the supporting frame and the mass and mounted along the respective adjacent edges of the frame and the mass for restricting movement of the mass structure in at least one direction along the at least one axis; and

sensing means coupled to at least the flexure for detecting movement of the mass structure.

2. A sensing device as in claim 1 wherein the stop means comprises upper and lower stop means for restricting movement of the mass structure to between two positions along the at least one axis.

3. A sensing device as in claim 2 wherein the flexure comprises a cantilever beam.

4. A sensing device as in claim 2 wherein the stop means are positioned in close proximity to both the frame and the mass to provide viscous gaseous damping of the mass.

5. A sensing device as in claim 2 wherein:

the upper stop means comprises a first recess in a surface of the mass and a first projection from the frame disposed to contact the mass when the mass is displaced upwardly from the frame.

6. A sensing device as in claim 5 wherein:

the lower stop means comprises a second recess in a surface of the frame and a second projection from the mass disposed to contact the frame when the mass is displaced downwardly from the frame.

7. A sensing device as in claim 3 wherein:

the frame comprises an annular-shaped body having an opening therethrough and the mass is disposed in the opening; and

the cantilever beam includes an upper surface aligned to an upper surface of the mass.

8. A sensing device as in claim 7 further comprising at least one additional cantilever beam coupled to each of the frame and the mass.

9. A sensing device as in claim 1 wherein each of the mass and the frame comprise monocrystalline silicon.

10. A sensing device as in claim 9 wherein the flexure comprises a cantilever beam integral to both the mass and the frame.

11. A sensing device as in claim 10 further comprising a resistive element disposed on the cantilever beam.

12. A sensing device as in claim 11 wherein the cantilever beam comprises a portion of an epitaxial silicon layer.

13. A sensing device as in claim 1 wherein the sensing means is coupled to the cantilever beam for detecting deflections therein.

14. A sensing device as in claim 13 wherein the sensing means comprises a resistor.

15. An accelerometer comprising:

an annular supporting frame having an opening therethrough, the frame comprising a monocrystalline silicon substrate and an overlying epitaxial layer of monocrystalline silicon;

a mass disposed in the opening and movable along an axis extending through the opening, the mass comprising a monocrystalline silicon substrate and an overlying epitaxial layer of monocrystalline silicon;

a cantilever beam extending between the frame and the mass within the epitaxial layer to couple the mass to the frame;

a plurality of stops within the epitaxial layer, each stop having a protrusion extending from one of the mass or the frame to the other of the mass or frame, each stop including a recess in the other of the mass or frame to define a travel distance between the recess and the protrusion; and

sensing means disposed in the cantilever beam for detecting relative motion between the frame and the mass.

16. An accelerometer as in claim 15 wherein alternate ones of the plurality of stops have protrusions extending from the mass to the frame.

17. An accelerometer as in claim 15 wherein a separation distance is provided between the frame and the mass, which distance is not less at a lower surface of the substrate than at the epitaxial layer.

18. A sensing device with a moving part and a non-moving part, the moving part being located in an opening in the non-moving part, the moving part being capable of a predefined range of motion along one axis, the axis being perpendicular to the non-moving part, and the non-moving part having overrange stops mounted thereon, the stops comprising protrusions on one of the moving or non-moving parts overlapping a recess on the other of the moving or non-moving part for preventing motion of the moving part beyond its predefined range.

19. A sensing device as in claim 18 with bidirectional overrange stops for preventing motion of the moving part beyond its predetermined range in either direction along its one axis of motion, the stops being formed by overlapping protrusions and recesses, both parts having protrusions and recesses'"'"' the protrusions and recesses being matched respectively with recesses and protrusions on the other part.

20. A method of fabricating a sensing device comprising:

forming an annular recess extending into a first surface of a substrate, the recess defining a second surface;

forming a layer over the first surface and over the recess, the layer not being in contact with the second surface;

removing an annular-shaped region of the substrate extending from a bottom surface of the substrate to the recess to thereby define a mass; and

removing a selected portion of the layer to define a cantilever beam extending across the recess and to define at least one stop over the recess for preventing movement of the mass beyond a fixed distance in a selected direction.

21. A method as in claim 20 wherein the step of forming comprises:

depositing the layer onto a body;

attaching the layer to the surface of the substrate; and

removing the body.

22. A method as in claim 21 wherein:

the substrate, the body and the layer comprise monocrystalline silicon; and

the step of removing comprises etching the body.

23. A method as in claim 20 wherein the layer comprises at least one of silicon, silicon nitride, and silicon dioxide.

24. A method as in claim 20 wherein the layer comprises a least one of silicon, silicon nitride, silicon dioxide, and metal.

25. A method as in claim 20 further comprising the step of:

forming electronic components in the layer.

26. A method as in claim 20 further comprising the step of:

attaching a backing plate to a third surface of the substrate opposite the first surface.

27. A method as in claim 26 wherein the step of defining an annular recess further comprises:

defining an additional recess in the third surface to provide a space between the backing plate and the mass.

28. A method as in claim 20 wherein the step of removing a selected portion comprises:

removing a serpentine-shaped portion to define at least one pair of coplanar stops for preventing movement of the mass beyond a fixed distance in both of two directions.

29. A method of fabricating an accelerometer comprising:

etching a first annular recess extending into an upper surface of a first silicon substrate, and a second recess extending into a lower surface of the first silicon substrate;

forming an epitaxial silicon layer over a surface of a second silicon substrate;

attaching the epitaxial silicon layer to the upper surface of the first silicon substrate;

removing the second silicon substrate;

forming electronic circuit elements in the epitaxial layer;

removing an annular-shaped region from the first substrate extending from the lower surface to the first annular recess to thereby define a mass and a frame; and

removing a selected portion of the epitaxial layer to define at least one cantilever beam extending between the mass and the frame and to define a plurality of protrusions over the first recess for restricting movement of the mass with respect to the frame.

30. A method as in claim 29 wherein the first substrate comprises a wafer within which a plurality of accelerometers are to be fabricated, and the method further comprises the steps:

attaching a backing plate to the lower surface of the wafer; and

cutting the wafer into a plurality of sections, each containing at least one frame and one mass.

31. A method as in claim 30 wherein the step of attaching follows the step of removing an annular-shaped region.

32. A sensing device comprising:

a supporting frame having an opening therein;

a mass disposed in the opening and movable along at least one axis;

a flexure coupled between the frame and the mass;

stop means integral to the supporting frame and the mass for restricting movement of the mass structure in the at least one direction along the at least one axis; and

sensing means coupled to at least the flexure for detecting movement of the mass structure,

the stop means further comprising an upper and lower stop means for restricting movement of the mass structure to between two positions along the at least one axis, the upper stop means further comprising a first recess in a surface of the mass and a first projection from the frame disposed to contact the mass when the mass is displaced upwardly from the frame.

33. A sensing device as in claim 32 wherein:

the lower stop means comprises a second recess in a surface of the frame and a second projection from the mass disposed to contact the frame when the mass is displaced downwardly from the frame.

34. A method of fabricating a sensing device comprising:

forming an annular recess extending into a first surface of a substrate, the recess defining a second surface;

forming a layer over the first surface and over the recess, the layer not being in contact with the second surface;

removing an annular-shaped region of the substrate extending from a bottom surface of the substrate to the recess to thereby define a mass; and

removing a selected portion of the layer to define a cantilever beam extending across the recess and to define at least one stop over the recess for preventing movement of the mass beyond a fixed distance in a selected direction,

the step of removing a selected portion of the layer further comprising removing a serpentine-shaped portion to define at least one pair of coplanar stops for preventing movement of the mass beyond a fixed distance in both of two directions.