Method for applying coatings to objects by means of magnetic field supported reactive cathode sputtering
First Claim
1. Method for applying coatings to objects by means of magnetic field supported cathode sputtering in a vacuum, wherein in order to maintain the glow discharge necessary for the sputtering of the target material, the method includes the steps wherein an inert gas is continuously fed into the coating chamber and, with the aid of a vacuum pump, is continuously pumped out of the coating chamber in such a way that a constant inert gas partial pressure is maintained in the coating chamber, and the step wherein at least one reactive gas is fed into the coating chamber, which forms a compound with the sputtered metallic target material, with which the workpieces are coated, characterized in that the total quantity of reactive gas continuously fed into the coating chamber is so chosen that the reactive gas component of the metal-reactive gas compound of the coating is in sub-stoichiometric relationship and there is no build up of reactive gas partial pressure, and that the step of feeding reactive gas into the coating chamber conducts the reactive gas flow directly into the space between the sputtering cathode and the workpieces to be coated, by-passing the sputtering cathode.
1 Assignment
0 Petitions
Accused Products
Abstract
A method is described for applying coatings to objects by means of magneticield supported cathode sputtering in a vacuum, wherein, in order to achieve an improved coating rate, the total reactive gas quantity fed into a coating chamber is so measured that the reactive gas portion in the metal-reactive gas compound of the coating on the workpiece, is present in sub-stoichiometric relationship, and wherein the reactive gas flow in the chamber is conducted directly into the area of the workpieces to be coated, by-passing the sputtering cathode.
-
Citations
14 Claims
- 1. Method for applying coatings to objects by means of magnetic field supported cathode sputtering in a vacuum, wherein in order to maintain the glow discharge necessary for the sputtering of the target material, the method includes the steps wherein an inert gas is continuously fed into the coating chamber and, with the aid of a vacuum pump, is continuously pumped out of the coating chamber in such a way that a constant inert gas partial pressure is maintained in the coating chamber, and the step wherein at least one reactive gas is fed into the coating chamber, which forms a compound with the sputtered metallic target material, with which the workpieces are coated, characterized in that the total quantity of reactive gas continuously fed into the coating chamber is so chosen that the reactive gas component of the metal-reactive gas compound of the coating is in sub-stoichiometric relationship and there is no build up of reactive gas partial pressure, and that the step of feeding reactive gas into the coating chamber conducts the reactive gas flow directly into the space between the sputtering cathode and the workpieces to be coated, by-passing the sputtering cathode.
Specification