Processing apparatus and method
First Claim
Patent Images
1. A vacuum process module capable of receiving a workpiece comprising:
- (a) a process chamber;
(b) a remote plasma generator remote from said process chamber;
(c) an in situ plasma generator within said process chamber;
(d) a radiant heater coupled to said process chamber; and
(e) a source of ultraviolet light within said process module.
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Abstract
A process module having remote plasma and in situ plasma generators, a source of ultraviolet, and a radiant heater, which represent four separate energy sources. The four sources can be used singly or in any combination and can be separately controllable.
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Citations
40 Claims
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1. A vacuum process module capable of receiving a workpiece comprising:
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(a) a process chamber; (b) a remote plasma generator remote from said process chamber; (c) an in situ plasma generator within said process chamber; (d) a radiant heater coupled to said process chamber; and (e) a source of ultraviolet light within said process module. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A vacuum process module capable of receiving a workpiece comprising:
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(a) a plasma generator generating at least free radicals remote from and in fluid communication with said workpiece; (b) an in situ plasma generator generating a plasma, said plasma being coupled to said workpiece; (c) a heater coupled to said workpiece; and (d) a source of ultraviolet light coupled to said workpiece. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A control system for use with a semiconductor processing module, comprising:
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(a) a plurality of independent energy sources coupled into the same process chamber; (b) at least one power source for each energy source having a first input; and (c) a computer system which is electrically coupled to said first input.
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22. A control system for use with a semiconductor processing module comprising:
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(a) a plurality of independent energy sources coupled into the same process chamber; (b) at least one power source for each energy source having a first input; (c) a control system providing sequential control which is electrically coupled to said first input.
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23. A control system for use with a semiconductor processing module comprising:
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(a) a plurality of independent energy sources coupled into the same process chamber; (b) at least one power source for each energy source having a first input; (c) a plurality of controllers which are electrically coupled to said first input and having a second input; and (d) a computer system which is electrically coupled to said second input.
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24. A control system for use with a semiconductor processing module comprising:
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(a) a plurality of independent energy sources coupled into the same process chamber each energy source having a first input; and (b) a computer system which is electrically coupled to at least some of said first inputs.
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25. A control system for use with a semiconductor processing module comprising:
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(a) a plurality of independent energy sources coupled into the same process chamber comprising; (b) each energy source having a first input; (c) a control system providing sequential control which is electrically coupled to said first input.
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26. A control system for use with a semiconductor processing module comprising:
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(a) a plurality of independent energy sources coupled into the same process chamber; (b) each energy source having a first input; (c) a plurality of controllers which are electrically coupled to said first input and having a second input; and (d) a computer system which is electrically connected to said second input.
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27. A control system for use with a semiconductor processing module which has a plurality of independent energy sources coupled into the same process chamber comprising;
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(a) a separate power source for each energy source having a first input; and (b) a computer system which is electrically connected to said first input.
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28. A control system for use with a semiconductor processing module which has a plurality of independent energy sources coupled into the same process chamber comprising;
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(a) a separate power source for each energy source having a first input; (b) a control system providing sequential control which is electrically connected to said first input.
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29. A control system for use with a semiconductor processing module which has a plurality of independent energy sources coupled into the same process chamber comprising;
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(a) a separate power source for each energy source having a first input; (b) a plurality of controllers which are electrically connected to said first input and having a second input; and (c) a computer system which is electrically connected to said second input.
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30. A control system for use with a semiconductor processing module which has at least two independent energy sources coupled into the same process chamber comprising;
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(a) a separate power source for each energy source having a first input; and (b) a computer sytem which is electrically connected to said first input.
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31. A control system for use with a semiconductor processing module which has at least two independent energy sources coupled into the same process chamber comprising;
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(a) a separate power source for each energy source having a first input; (b) a control system providing sequential control which is electrically connected to said first input.
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32. A control system for use with a semiconductor processing module which has at least two independent energy sources coupled into the same process chamber comprising;
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(a) a separate power source for each energy source having a first input; (b) a plurality of controllers which are electrically connected to said first input and having a second input; and (c) a computer system which is electrically connected to said second input.
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33. A method processing a workpiece in a process chamber comprising the steps of:
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(a) introducing free radicals to the workpiece; (b) coupling an energy source to the process chamber; (c) independently controlling free radical and other particle concentrations and energies in said process chamber. - View Dependent Claims (34, 35)
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36. A method for controlling at least a first and second independent energy source coupled into the same semiconductor processing chamber comprising;
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(a) providing at least one power source for each of said first and second independent energy sources; and (b) controlling said at least one power source using a computer system.
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37. A method for controlling a plurality of independent energy sources coupled into the same semiconductor processing chamber comprising;
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(a) applying a first selected energy level to a first energy source; (b) applying a second selected energy level to a second energy source; and (c) modifying said first selected energy level. - View Dependent Claims (38, 39, 40)
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Specification