Birefringent optical waveguide structure having a strip waveguide buried in a cladding layer and the method of manufacturing

• US 4,889,401 A
• Filed: 07/15/1988
• Issued: 12/26/1989
• Est. Priority Date: 09/25/1987
• Status: Expired due to Fees

• Current Assignee: Siemens AG
• Original Assignee: Siemens AG
• Inventors: Karstensen, Holger, Zrschizky, Helmut, Schneider, Hartmut, Klement, Ekkehard
• Primary Examiner(s): Lee, John D.
• Application Number:
  US07/219,579
• Time in Patent Office: 529 Days
• Field of Search: 350/96.11, 350/96.12, 350/96.13, 350/96.14, 350/96.30, 350/96.33
• US Class Current: 385/131
• CPC Class Codes: G02B 6/126 using polarisation effects G02B6/1226 takes precedence

Abstract

A birefringent optical waveguide structure comprises at least one or more strip waveguides of a first material embedded in a cladding layer of a second glass with at least one additional layer being applied on the cladding layer. The strip waveguides have a refractive index which is higher than the refractive index of the second glass of the cladding layers and the additional layer applies a mechanical stress to the strip waveguides which has a component extending perpendicular to the strip waveguides. Preferably, the mechanical stress is formed by the material of the additional layers having a different thermal expansion coefficient and a different elasto-optical coefficient than the materials forming the cladding layer and the strip waveguides. The method of forming the device includes rapidly cooling the structure from an elevated temperature to room temperature to create the mechanical stresses.

Claims

1. A birefringent optical waveguide structure comprising at least one strip waveguide of a first material being buried in a cladding layer of a second material, each strip waveguide having a longitudinal axis, said cladding layer with the strip waveguide being positioned between two additional layers, said first material having an index of refraction higher than the index of refraction of the second material and both of the additional layers applying a mechanical stress on the cladding layer and on each strip waveguide with a component of the stress extending perpendicular to the longitudinal axis of the waveguide.

2. A birefringent optical waveguide structure according to claim 1, comprising at least two strip waveguides.

3. A birefringent optical waveguide structure according to claim 1, wherein the first material and the second material are glass and each of the two additional layers are of a glass having a different coefficient of thermal expansion and different elasto-optical coefficient in comparison to the glass of the first material and second material.

4. A birefringent optical waveguide structure comprising at least one strip waveguide of a first material being buried in a cladding layer of a second material and at least one additional layer being provided on the cladding layer, each strip waveguide having a longitudinal axis, said first material having an index of refraction higher than the index of refraction of the second material and the additional layer applying a mechanical stress on each strip waveguide with a component of the stress extending perpendicular to the longitudinal axis of the waveguide, the first material and the second material being glass materials, the material of the additional layer being a glass material having a different coefficient of thermal expansion and a different elasto-optical coefficient in comparison to the glass materials of the strip waveguide and cladding layer.

5. A birefringent optical waveguide structure according to claim 4, comprising at least two strip waveguides.

6. A method of forming a birefringent optical waveguide structure having at least one strip waveguide of a first material buried in a cladding layer of a second material and at least one additional layer being provided on the cladding layer, each strip waveguide having a longitudinal axis, said first material having a refractive index higher than the refractive index of the second material and said additional layer applying a mechanical stress to each strip waveguide with a component of the stress extending perpendicular to the longitudinal axis of the waveguide, said method comprising the steps of providing a substrate with a cladding layer having at least one strip waveguide embedded therein and having an additional layer on the cladding layer to form a structure, heating the structure to a relatively high elevated temperature and then subjecting the structure to a rapid cooling to room temperature.

7. A method according to claim 6, wherein the step of providing the structure having at least one strip waveguide embedded in a cladding layer includes providing the cladding layer and embedding the strip waveguide by a field-induced ion exchange.

8. A method according to claim 6, wherein the step of providing the structure having a cladding layer with a strip waveguide embedded therein includes providing a cladding layer and then diffusing the strip waveguide into the cladding layer.

9. A method according to claim 6, wherein the step of providing the structure having the cladding layer with the strip waveguide embedded therein includes providing the cladding layer and ion implanting the strip waveguide in the cladding layer.

10. A method according to claim 6, wherein the step of providing the structure having the cladding layer with at least one embedded strip waveguide and having an additional layer comprises providing a substrate, providing an additional layer on said substrate, providing a first cladding layer on said additional layer, providing a layer of first material for forming the strip waveguide, forming the strip waveguide from said layer of first material, and applying a second cladding layer to cover the strip waveguide.

11. A method according to claim 10, wherein the step of applying the layers applies the layers by sputtering.

12. A method according to claim 10, wherein the method of applying the layers on the substrate applies the layers by vapor depositing from a vapor phase.

13. A method according to claim 12, wherein the step of vapor depositing the layers deposits glass layers by a CVD method.

14. A method according to claim 10, which includes, after applying the second cladding layer, applying a second additional layer so that the two cladding layers and the strip waveguide are sandwiched between two additional layers.