Diaphragm system for generating a plurality of particle probes haivng variable cross section

• US 4,899,060 A
• Filed: 06/13/1989
• Issued: 02/06/1990
• Est. Priority Date: 05/08/1987
• Status: Expired due to Fees

• Current Assignee: Siemens AG
• Original Assignee: Siemens AG
• Inventors: Lischke, Burkhard
• Primary Examiner(s): Berman, Jack I.
• Application Number:
  US07/368,959
• Time in Patent Office: 238 Days
• Field of Search: 250/505.1, 250/492.23, 250/492.2
• US Class Current: 250/505.1
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: H01J 37/09 Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe

Abstract

A diaphragm system includes two diaphragms provided with the same multi-aperture arranged following one another in a beam path of lithography equipment so that recesses in the first diaphragm coincide with corresponding recesses in the second diaphragm. A primary particle beam is directed onto the first diaphragm which is equipped with deflection elements for individual displacement of the particle probes in a plane of the second diaphragm. In a second embodiment, the diaphragm system provides simultaneous variation of the cross section of all particle probes by providing that one of the two diaphragms be displaceable in a plane perpendicular to the beam direction.

Claims

1. A diaphragm system for generating a plurality of particle probes having variable cross sections from a particle beam, comprising:

a first diaphragm for receiving a particle beam and having a first multi-aperture structure;

a second diaphragm disposed following said first diaphragm in a direction of the particle beam, said second diaphragm having a second multi-aperture structure corresponding to said first multi-aperture structure of said first diaphragm, said first and second diaphragms oriented relative to one another so that in a non-displaced condition apertures of said first multi-aperture structure coincide with corresponding apertures of said second multi-aperture structure; and

means for displacing one of said first or second diaphragms in a plane perpendicular to the direction of the particle beam.

2. A diaphragm system as claimed in claim 1, wherein said multi-aperture structure of said first and second diaphragms have rectangular or quadratic apertures.

3. A diaphragm system as claimed in claim 2, wherein said apertures are arranged along a line.

4. A diaphragm system as claimed in claim 1, wherein said means for displacing is a means for relative shifting of said first and second diaphragms relative to one another.