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Electrically-programmable low-impedance anti-fuse element

  • US 4,899,205 A
  • Filed: 12/28/1987
  • Issued: 02/06/1990
  • Est. Priority Date: 05/09/1986
  • Status: Expired due to Term
First Claim
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1. An electrically-programmable, low-impedance anti-fuse element, including:

  • a p-type semiconductor substrate,a first electrode comprising a diffusion region in said substrate,a dielectric layer over said diffusion region, said dielectric layer including a first silicon dioxide portion and a second silicon nitride portion over said first silicon dioxide portion,a second electrode over said dielectric layer,wherein at least one of said first and said second electrodes is heavily doped or implanted with arsenic such that a high concentration of arsenic atoms exists at the interface between said dielectric layer and said electrode, and a controlled radius conductive filament in said dielectric layer electrically connecting said first and second electrodes.

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