Surface treatment apparatus

• US 4,901,667 A
• Filed: 08/01/1986
• Issued: 02/20/1990
• Est. Priority Date: 08/09/1985
• Status: Expired due to Fees

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Suzuki, Keizo, Ninomiya, Ken, Okada, Osami, Nishimatsu, Shigeru
• Primary Examiner(s): Bueker, Richard
• Application Number:
  US06/891,641
• Time in Patent Office: 1,299 Days
• Field of Search: 118/715, 118/724, 118/719, 156/345
• US Class Current: 118/719
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species

Abstract

A surface treatment apparatus comprising a vacuum chamber, means for introducing a gas into the vacuum chamber, a gas furnace for heating and activating the gas while it is being introduced, apertures for injecting the heated gas, and a substrate stage for holding a substrate of which the surface is to be treated by the injected gas. The gas that is heated and activated is blown onto the surface of the substrate to treat the surface without causing the surface to be damaged. Therefore, the apparatus can be employed very effectively for a process for producing semiconductor elements.

Claims

1. A surface treatment apparatus comprising:

a vacuum chamber;

gas introducing means for introducing a gas into said vacuum chamber;

gas heating means for heating said gas and activating said gas to make active particles while the gas is being introduced, said gas heating means comprising a gas furnace and a heater for heating said gas furnace,

gas injecting means for injecting said activated gas into said vacuum chamber to form a beam of said active particles; and

substrate holding means installed in said vacuum chamber to hold a substrate of which a surface is to be treated in a position opposite to said gas injecting means, to allow said beam to impinge on said surface in a perpendicular direction to said surface.

2. A surface treatment apparatus according to claim 1, wherein said gas injecting means exists in said heater.

3. A surface treatment apparatus according to claim 1, wherein said gas injecting means includes apertures between a side facing said gas furnace and another side facing said substrate, said apertures being different at each side.

4. A surface treatment apparatus according to claim 1, wherein said gas furnace is provided with a bypass exhaust line.

5. A surface treatment apparatus according to claim 1, wherein said heater and said gas furnace are separable from each other.

6. A surface treatment apparatus according to claim 1, wherein said gas furnace is made of a material selected from any one of quartz, alumina, sapphire, carbon and nickel.

7. A surface treatment apparatus according to claim 1, wherein said gas that is introduced consists of at least one of halogen atoms or partly of halogen atoms in molecules.

8. A surface treatment apparatus according to claim 1, wherein said gas that is introduced consists of least one of oxygen or nitrogen.

9. A surface treatment apparatus according to claim 1, wherein a collimator is provided between said gas injecting means and said substrate for collimating said beam, said collimator having a plurality of holes which are parallel to an axis connecting said gas injecting means and said substrate.

10. A surface treatment apparatus according to claim 1, wherein a shielding plate is provided between said gas heating means and said substrate.

11. A surface treatment apparatus according to claim 1, wherein said heater is disposed outside said vacuum chamber.

12. A surface treatment apparatus according to claim 1, wherein said vacuum chamber is divided into two sections, said gas heating means is provided in a first section of said vacuum chamber and said substrate is placed in a second section of said vacuum chamber, and said sections of said vacuum chamber are differentially evacuated.

13. A surface treatment apparatus according to claim 1, wherein said vacuum chamber is divided into two sections, said gas heating means is provided in a first section of said vacuum chamber and said substrate is placed in a second section of said vacuum chamber, and a gate valve is provided between said first section of said vacuum chamber in which said gas heating means is provided and said second section of said vacuum chamber in which said substrate is placed.

14. A surface treatment apparatus according to claim 1, wherein an aperture of said gas injection means has side walls which define an opening with a cross-sectional area which increases in a direction toward said substrate.

15. A surface treatment apparatus according to claim 12, wherein said first and second sections of said vacuum chamber are connected by a bellows.

16. A surface treatment apparatus according to claim 1, wherein said gas furnace includes barrier walls.

17. A surface treatment apparatus according to claim 1, wherein said gas furnace includes a filler material.