Method of producing brazing metals

• US 4,901,904 A
• Filed: 04/12/1988
• Issued: 02/20/1990
• Est. Priority Date: 07/22/1985
• Status: Expired due to Term

• Current Assignee: NGK Insulators Limited
• Original Assignee: NGK Insulators Limited
• Inventors: Tsuno, Nobuo
• Primary Examiner(s): Seidel, Richard K.
• Assistant Examiner(s): Heinrich, Samuel M.
• Application Number:
  US07/183,309
• Time in Patent Office: 679 Days
• Field of Search: 228/198, 228/122, 228/56.3, 228/124, 228/121, 164/46
• US Class Current: 228/56.3
• CPC Class Codes: B23K 35/004 at least one of the workpieces being of a metal of the iron group
• CPC Class Codes: C04B 2235/963 Surface properties, e.g. surface roughness
• CPC Class Codes: C04B 2237/125 based on noble metals, e.g. silver
• CPC Class Codes: C04B 2237/126 wherein the active component for bonding is not the largest fraction of the interlayer
• CPC Class Codes: C04B 2237/127 The active component for bonding being a refractory metal
• CPC Class Codes: C04B 2237/341 Silica or silicates
• CPC Class Codes: C04B 2237/343 Alumina or aluminates
• CPC Class Codes: C04B 2237/346 Titania or titanates
• CPC Class Codes: C04B 2237/348 Zirconia, hafnia, zirconates or hafnates
• CPC Class Codes: C04B 2237/365 Silicon carbide
• CPC Class Codes: C04B 2237/368 Silicon nitride
• CPC Class Codes: C04B 2237/406 Iron, e.g. steel
• CPC Class Codes: C04B 2237/708 of one or more of the interlayers
• CPC Class Codes: C04B 2237/72 Forming laminates or joined articles comprising at least two interlayers directly next to each other
• CPC Class Codes: C04B 2237/78 Side-way connecting, e.g. connecting two plates through their sides
• CPC Class Codes: C04B 37/006 consisting of metals or metal salts
• CPC Class Codes: C04B 37/026 consisting of metals or metal salts
• CPC Class Codes: F02F 7/0087 Ceramic materials
• CPC Class Codes: F05C 2251/042 Expansivity
• CPC Class Codes: Y10S 428/938 Vapor deposition or gas diffusion
• CPC Class Codes: Y10T 428/12576 : Boride, carbide or nitride component
• CPC Class Codes: Y10T 428/12611 : Oxide-containing component
• CPC Class Codes: Y10T 428/12618 : Plural oxides
• CPC Class Codes: Y10T 428/12806 : Refractory [Group IVB, VB, or VIB] metal-base component
• CPC Class Codes: Y10T 428/12819 : Group VB metal-base component
• CPC Class Codes: Y10T 428/12826 : Group VIB metal-base component
• CPC Class Codes: Y10T 428/1284 : W-base component
• CPC Class Codes: Y10T 428/12979 : Containing more than 10% nonferrous elements [e.g., high alloy, stainless]

Abstract

Active brazing metals that can joint ceramic members mutually or a ceramic member and a metallic member to each other with high joint strength and improved availability can be provided in various shapes such as plate or wire, even when a metal of poor ductility is used as a raw material of the brazing metals.

Claims

1. A method of producing brazing metals having a layered structure for joining ceramic members mutually or a ceramic member and a metallic member to each other comprising:

adjusting at least one surface of a metal substrate to a surface roughness of center line average height of Ra of 0.5-2.0 microns; and

applying at least one active metal layer, which has a melting point higher than that of the metal substrate, on said at least one surface of said metal substrate by a process selected from the group consisting of physical vapor deposition, chemical vapor deposition, and metal plating, to a thickness of 5×

10^-4 -0.1 mm, such that a thickness ratio or a thickness to diameter ratio of the active metal layer to the metal substrate is in a range of 1×

10^-2 -1×

10^-1 and a weight ratio of the active layer to the metal substrate is in a range of 0.7-4.4%.

2. A method according to claim 1, wherein the metal substrate is a plate or wire produced by at least one method selected from the group consisting of rolling, drawing and liquid quenching.

3. A method according to claim 1, wherein the ceramic member to be joined is at least one ceramic selected from the group consisting of silicon nitride, silicon carbide and sialon, and the active metal layer is at least one metal element selected from the group consisting of Zr, Ti, B, Ta, Hf, V, Cr, La, Sc, Y and Mo.

4. A method according to claim 1, wherein the ceramic member to be joined is at least one ceramic selected from the group consisting of zirconium, alumina, mullite, aluminum titanate and cordierite, and the active metal layer is at least one metal element selected from the group consisting of Be, Ce, Zr and Ti.

5. A method according to claim 1, wherein the metal substrate has a plate-shape and the active metal layer is applied on only one surface thereof.

6. A method according to claim 1, wherein the physical vapor deposition process is selected from the group consisting of vacuum deposition, sputtering and ion plating.

7. A method of producing brazing metals having a layered structure for joining ceramic members mutually or a ceramic member and a metallic member to each other comprising:

adjusting at least one surface of a metal substrate to a surface roughness of center line average height of Ra of 0.5-2.0 microns; and

applying at least one active metal layer, which has a melting point higher than that of the metal substrate, on said at least one surface of said metal substrate by a process selected from the group consisting of physical vapor deposition, chemical vapor deposition, and metal plating, to a thickness of 5×

10^-4 -0.1 mm, such that a thickness ratio or a thickness to diameter ratio of the active metal layer to the metal substrate is in a range of 1×

10^-2 -1×

10^-1 and an atomic ratio of the active metal layer to the metal substrate is in a range of 1.2-5.4%.

8. A method according to claim 7, wherein the metal substrate is a plate or wire produced by at least one method selected from the group consisting of rolling, drawing and liquid quenching.

9. A method according to claim 7, wherein the ceramic member to be joined is at least one ceramic selected from the group consisting silicon nitride, silicon carbide and sialon, and the active metal layer is at least one metal element selected from the group consisting of Zr, Ti, B, Ta, Hf, V, Cr, La, Sc, Y and Mo.

10. A method according to claim 7, wherein the ceramic member to be joined is at least one ceramic selected from the group consisting of zirconium, alumina, mullite, aluminum titanate and cordierite, and the active metal layer is at least one metal element selected from the group consisting of Be, Ce, Zr and Ti.

11. A method according to claim 7, wherein the metal substrate has a plate-shape and the active metal layer is applied on only one surface thereof.

12. A method according to claim 7, wherein the physical vapor deposition process is selected from the group consisting of vacuum deposition, sputtering and ion plating.