Method and an apparatus for aligning first and second objects with each other

• US 4,902,133 A
• Filed: 09/30/1988
• Issued: 02/20/1990
• Est. Priority Date: 09/30/1987
• Status: Expired due to Term

• Current Assignee: Tokyo Kogaku Kikai Kabushiki Kaisha 75-1 Hasunuma-Cho Itabashi-Ku Tokyo Japan, Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Tokyo Kogaku Kikai Kabushiki Kaisha, Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Kuwabara, Osamu, Tojo, Toru, Kamiya, Masashi, Yoshino, Hisakazu
• Primary Examiner(s): Willis, Davis L.
• Assistant Examiner(s): Koren, Matthew W.
• Application Number:
  US07/251,842
• Time in Patent Office: 508 Days
• Field of Search: 356/356, 356/363, 356/400, 356/401
• US Class Current: 356/509
• CPC Class Codes: G03F 9/7049 Technique, e.g. interferometric

Abstract

A distance between a mask and a wafer is set such that exposure light beams emerged from the mask are converged by the projection lens to be focused on the wafer. According to the present invention, two mask marks of diffraction gratings are formed on the mask and spaced at a predetermined distance from each other. When the alignment light beams are applied to the mask marks, two diffracted light beams of predetermined order emerge individually from the mask marks in such a manner that the respective optical axes of the two diffracted light beams, which are directed opposite to the advancing direction of the diffracted light beams, intersect each other one the first point. Thus, the diffracted light beams advance as if the diffracted light beams were the two light beams emerging from the first point. Therefore, the two diffracted light beams can be focused on the wafer or neighborhood of it. The diffracted light beams can be incident on a wafer mark which is formed on the wafer and is diffraction grating. Thus rediffracted light beams emerge from the wafer mark and are detected, so that the mask and the wafer are aligned with each other. Accordingly, the alignment can be performed, despite a great diffraction between the wave-lengths of the exposure light beam and the alignment light beam.

Claims

1. A method for aligning first and second objects with each other, which objects are moved relative to each other and in parallel, so as to be aligned, a projection lens being disposed between said first and second objects, a first mark formed on said first object, said first mark including a diffraction grating region having two diffraction points, each capable of diffracting a light beam applied thereto, the two diffraction points spaced at predetermined distance from each other, a second mark formed on said second objects, said second mark including a diffraction grating region,

said method comprising steps of:

directing an alignment light beam emitted from a light source to said first mark, the alignment light beam diffracted by the two diffraction points of said first mark, so that two diffracted light beams or predetermined orders emerge individually from the two diffraction points in such a manner that the respective optical axes of the two predetermined-order diffracted light beams, which are directed opposite to the advancing direction of the diffracted light beams, intersect each other on a first intersection point at a predetermined distance from said first mark;

transferring the two predetermined-order diffracted light beams through the projection lens toward said second mark, so that the two diffracted light beams are converged by the projection lens and are incident on the diffraction grating region of said second mark in such a manner that the respective optical axes of the two diffracted light beams, which are directed to the advancing direction of said diffracted light beams, intersect each other on a second intersection point at a predetermined distance (=d₁ ≧

0) from said second mark, whereby the two diffracted light beams are diffracted by the diffraction grating region of said second mark, and two re-diffracted light beams of predetermined orders emerge from the diffraction grating region of said second objects;

detecting the predetermined-order re-diffracted light beams and generating a detection signal; and

adjusting said first and second objects relative to each other in response to the detection signal, thereby aligning said first and second objects with each other.

2. The method according to claim 1, wherein a light beam with a wavelength different from that of the alignment light beam is emitted from a second light source and applied to the first object so that an image of the first object is projected on the second object by means of the emitted light beam transmitted thorough the projection lens.

3. The method according to claim 1, wherein the wavelength of said alignment light beam is different from that of an exposure light beam used in a projection/exposure unit.

4. The method according to claim 1, wherein said first object is a mask used with the projection/exposure unit, and said second object is a wafer.

5. The method according to claim 1, wherein the two predetermined-order diffracted light beams are separately incident upon the diffraction grating region of said second mark when the distance between said second mark and the second intersection point is positive.

6. The method according to claim 5, wherein when the two diffracted light beams are separately incident on the diffraction grating region of said second mark, the two re-diffracted light beams emerge separately from the diffraction grating region of said second mark, interfere with each other, and then are detected.

7. The method according to claim 6, wherein the first and second intersection points are situated on an optical axis of the projection lens.

8. The method according to claim 1, wherein the distance between said second mark and the second intersection point is zero, so that the two diffracted light beams are converged on the second intersection point which is situated on the diffraction grating region of said second mark.

9. The method according to claim 8, wherein when the two diffracted light beams are converged on the second intersection point which is situated on the diffraction grating region of said second mark, the two diffracted light beams interfere with each other, so that two interfering re-diffracted light beams are emerged from the diffraction grating region of said second mark, and are detected thereafter.

10. The method according to claim 9, wherein the first and second intersection points are situated on an optical axis of the projection lens.

11. The method according to claim 1, wherein the first and second intersection points are situated on an optical axis of the projection lens;

and there is a relation

space="preserve" listing-type="equation">r=Dtanβ

θ

where D is the distance between the first intersection point and said first mark, β

is inverse magnification of the projection lens for the alignment light beam, indicative of the relation between the first and second intersection points, r is half the distance between the two diffraction points of said first mark.

12. The method according to claim 11, wherein there is a relation

13. The method according to claim 1, wherein said first mark includes two diffraction grating regions each having the diffraction point.

14. The method according to claim 13, wherein the alignment light beam is applied uniformly to the first object over a wide region thereof.

15. The method according to claim 13, wherein the alignment light beam is applied separately to the two diffraction points of said first mark.

16. The method according to claim 1, wherein said first mark includes a plurality of pairs of diffraction grating regions each having diffraction point.

17. The method according to claim 1, wherein the diffraction grating region of said first mark is a one-or two-dimensional diffraction grating or a checked diffraction grating, and the diffraction grating of said second mark is a one- or two-dimensional diffraction grating or a checked diffraction grating.

18. The method according to claim 4, wherein said first mark includes a plurality of pairs of diffraction grating regions each having diffraction point and arranged on a dicing line outside a circuit pattern of the mask, said plurality of pairs of diffraction grating regions being situated on that portion of the mask on which an image of the second mark is projected by means of an exposure light beam transmitted through the projection lens.

19. The method according to claim 1, wherein the alignment light beam is incident on said first mark after the phase of the alignment light beam is modulated, and said re-diffracted light beams from are then synchronously demodulated.

20. The method according to claim 1, wherein the alignment light beam is a spherical wave incident on an incidence pupil of the projection lens.

21. The method according to claim 20, wherein the two diffracted light beams are ±

1-order diffracted light beams.

22. The method according to claim 1, wherein the two re-diffracted light beams are ±

1-order diffracted light beams.

23. The method according to claim 11, wherein the values θ

and r are set so that a 0-order diffracted light beam diffracted by the first mark cannot be incident on the second mark after being transmitted the projection lens.

24. A method for aligning first and second objects with each other, which objects are moved relative to each other and in parallel, so as to be aligned, a projection lens being disposed between said first and second objects,

wherein a distance between said first and second objects is set such that first imaginary light beams emerged from said first object are converged by the projection lens to be focused on said second object,

wherein a first point is located at a predetermined distance from said first object apart from the projection lens, and a second point is located at a predetermined distance from said second object apart from the projection lens,

wherein two second imaginary light beams with a wavelength longer than that of the first imaginary light beam emerge from the first point, and advance in such optical paths that the two second imaginary light beams are transferred to said first object to be spaced at a distance from each other, are converged by the projection lens, are transferred to said second object to be spaced at a distance from each other, and are then focused one the second point,

wherein a first mark is a formed on said first object, and said first mark includes a diffraction grating region having two diffraction points which are spaced from each other such that the two diffraction points are respectively located on the optical paths of the two second imaginary light beams,

and wherein a second mark is formed on said second object, and said second mark includes a diffraction grating region having two diffraction points which are spaced from each other such that the two diffraction points are respectively located on the optical paths of the two second imaginary light beams,

said method comprising steps of:

directing an alignment light beam emitted from a light source to said first mark, the alignment light beam having same wavelength of the second imaginary light beam, the alignment light beam diffracted by the two diffraction points of said first mark, so that two diffracted light beams of predetermined orders emerge individually from the two diffraction points of said first mark in such a manner that the respective optical axes of the two predetermined-order diffracted light beams, which are directed opposite to the advancing direction of the diffracted light beams, intersect each other on the first point, whereby the two diffracted light beams advance respectively along the optical paths of the second imaginary light beams;

transferring the two diffracted light beams through the projection lens toward said second mark along the optical paths of the second imaginary light beams, so that the two diffracted light beams are converged by the projection lens and are respectively incident on the two diffraction points of said second mark, whereby the two diffracted light beams are respectively diffracted by the two diffraction points of said second mark, and two re-diffracted light beams of predetermined order emerge and then interfere with each other;

detecting the two interfering re-diffracted light beams and generating a detection signal; and

adjusting said first and second objects relative to each other in response to the detection signal, thereby aligning said first and second objects with each other.

25. The method according to claim 24, wherein the distance between said first object and the first point is extremely longer than the distance between said second object and the second point, so that distance between two diffraction points of said first mark is extremely longer that the distance between two diffraction points of said second mark.

26. A method for aligning first and second objects with each other, which objects are moved relative to each other and in parallel, so as to be aligned, a projection lens being disposed between said first and second objects,

wherein a distance between said first and second objects is set such that first imaginary light beams emerged from said first object are converged by the projection lens to be focused on said second object,

wherein a first point is located at a predetermined distance from said first object apart from the projections lens, a second point is located on said second object,

wherein two second imaginary light beams with a wavelength longer than that of the first imaginary light beam emerge from the first point, and advance in such optical paths that the two second imaginary light beams are transferred to said first object to be spaced at a distance from each other, are converged by the projection lens, and are then transferred to said second object to be focused on said on the second point of said second object,

wherein a first mark is formed on said first object, and said first mark includes a diffraction grating region having two diffraction points which are spaced from each other such that the two diffraction points are respectively located on the optical paths of the two second imaginary light beams,

and wherein a second mark is formed on said second object, and said second mark includes a diffraction grating region having a diffraction point which are located on the second point of said second object,

said method comprising steps of:

directing an alignment light beam emitted from a light source to said first mark, the alignment light beam having same wavelength of the second imaginary light beam, the alignment light beam diffracted by the two diffraction pints of said first mark, so that two diffracted light beams of predetermined orders emerge individually from the two diffraction points of said first mark in such a manner that the respective optical axes of the two predetermined-order diffracted light beams, which are directed opposite to the advancing direction of the diffracted light beams, intersect each other on the first point, whereby the two diffracted light beams advance respectively along the optical paths of the second imaginary light beams;

transferring the two diffracted light beams through the projection lens toward said second mark along the optical paths of the second imaginary light beam, so that the two diffracted light beams are converged by the projection lens and are respectively incident on the diffraction point of said second mark, whereby the two diffracted light beams interfere with each other and are respectively diffracted by the diffraction point of said second mark, and two interfering re-diffracted light beams of predetermined orders emerge;

detecting the two interfering re-diffracted light beams and generating a detection signal; and

adjusting said first and second objects relative to each other in response to the detection signal, thereby aligning said first and second objects with each other.

27. An apparatus for aligning first and second objects with each other, which objects are moved relative to each other and in parallel, so as to be aligned, a projection lens being disposed between said first and second objects, comprising:

a first mark formed on said first object, said first mark including a diffraction grating region having two diffraction points, each capable of diffracting a light beam applied thereto, the two diffraction points spaced at a predetermined distance from each other;

a second mark formed on said second objects, said second mark including a diffraction grating region;

a light source for emitting an alignment light beam;

means for directing the alignment light beam to said first mark, the alignment light beam diffracted by the two diffraction points of said first mark, so that two diffracted light beams of predetermined orders emerge individually from the two diffraction points in such a manner that the respectively optical axes of the two predetermined-order diffracted light beams, which are directed opposite to the advancing direction of the diffracted light beams, intersect each other on a first intersection point at a predetermined distance from said first mark, the two predetermined-order diffracted light beams transferred through the projection lens toward said second mark, so that the two diffracted light beams are converged by the projection lens and are incident on the diffraction grating region of said second mark in such a manner that the respective optical axes of the two diffracted light beams, which are directed to the advancing direction of the diffracted light beams, intersect each other on a second intersection point at a predetermined distance (=d₁ ≧

0) from said second mark, whereby the two diffracted light beams are diffracted by the diffraction grating region of said second mark, and two-diffracted light beams of predetermined orders emerge from the diffraction grating region of said second objects;

means for detecting the predetermined-order re-diffracted light beams and generating a detection signal; and

means for adjusting said first and second objects relative to each other in response to the detection signal, thereby aligning said first and second objects with each other.

28. The apparatus according to claim 27, further comprising a second light source for emitting and applying a light beam with a wavelength different from that of the alignment light beam to the first object so that an image of the first object is projected on the second object by means of the emitted light beam transmitted thorough the projection lens.

29. The apparatus according to claim 27, where in the wavelength of said alignment light beam is different from that of an exposure light beam used in a projection/exposure unit.

30. The apparatus according to claim 27, wherein said first object is a mask used with the projection/exposure unit, and said second object is a wafer.

31. The apparatus according to claim 27, wherein said first and second marks are arranged so that the two predetermined-order diffracted light beams are separately incident upon the diffraction grating region of said second mark when the distance between said second mark and the second intersection point is positive.

32. The apparatus according to claim 31, wherein when the two diffracted light beams are separately incident on the diffraction grating region of said second mark, the two re-diffracted light beams emerge separately from the diffraction grating region of said second mark, said detecting means including means for interfering the two re-diffracted light beams with each other and means for picking up the two interfering re-diffracting light beams.

33. The apparatus according to claim 32, wherein the first and second intersection points are situated on an optical axis of the projection lens.

34. The apparatus according to claim 27, wherein the distance between said second mark and the second intersection point is zero, so hat the two diffracted light beams are converged on the second intersection point which is situated on the diffraction grating region of said second mark.

35. The apparatus according to claim 34, wherein when the two diffracted light beams are converged on the second intersection point which is situated on the diffraction grating region of said second mark, the two diffracted light beams interfere with each other, so that two interfering re-diffracted light beams are emerged from the diffraction grating region of said second mark, said detecting including means for picking up the two interfering re-diffracted light beams.

36. The apparatus according to claim 35, wherein the first and second intersection points are situated on an optical axis of the projection lens.

37. The apparatus according to claim 27, wherein the first and second intersection points are situated on an optical axis of the projection lens;

and there is a relation

space="preserve" listing-type="equation">r=Dtanβ

θ

where D is the distance between the first intersection point and said first mark, β

is inverse magnification of the projection lens for the alignment light beam, indicative of the relation between the first and second intersection points, r is half the distance between the two diffraction points of said first mark.

38. The apparatus according to claim 37, wherein there is a relation

39. The apparatus according to claim 27, wherein said first mark includes two diffraction grating regions each having the diffraction point.

40. The apparatus according to claim 39, wherein the alignment light beam is applied uniformly to the first object over a wide region thereof.

41. The apparatus according to claim 39, wherein the alignment light beam is applied separately to the two diffraction points of said first mark.

42. The apparatus according to claim 27, wherein said first mark includes a plurality of pairs of diffraction grating regions each having diffraction point.

43. The apparatus according to claim 27, wherein the diffraction grating region of said first mark is a one- or two-dimensional diffraction grating or a checked diffraction grating, and the diffraction grating of said second mark is a one- or two-dimensional diffraction grating or a checked diffraction grating.

44. The apparatus according to claim 30, wherein said first mark includes a plurality of pairs of diffraction grating regions each having diffraction point and arranged on a dicing line outside a circuit pattern of the mask, said plurality of pairs of diffraction grating regions being situated on that portion of the mask on which an image of the second mark is projected by means of an exposure light beam transmitted through the projection lens.

45. The apparatus according to claim 27, wherein the alignment light beam is incident on said first mark after the phase of the alignment light beam is modulated, and said re-diffracted light beams from are then synchronously demodulated.

46. The apparatus according to claim 27, wherein the alignment light beam is a spherical wave incident on an incidence pupil of the projection lens.

47. The apparatus according to claim 46, wherein the two diffracted light beam are ±

1-order diffracted light beams.

48. The apparatus according to claim 27, wherein the two-diffracted light beams are ±

1-order diffracted light beams.

49. The apparatus according to claim 37, wherein the values θ

and r are set so that a 0-order diffracted light beam diffracted by the first mark cannot be incident on the second mark after being transmitted through the projection lens.