Epitaxial substrate for high-intensity led, and method of manufacturing same
First Claim
1. An epitaxial substate for a high-intensity LED, comprising:
- a double-hetero structure epitaxial layer formed by vapor phase epitaxy; and
an epitaxial layer formed by liquid phase epitaxy on said double-hetero structure epitaxial layer;
said double-hetero structure epitaxial layer being formed by removing a compound semiconductor substrate after said double-hetero structure epitaxial layer has been formed thereon.
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Abstract
An epitaxial layer having a double-hetero structure is forming using an MOCVD process or an MBE process, and an epitaxial substrate is formed using an LPE process, thereby forming a substrate which exploits the distinguishing features of both processes. Since the MOCVD process or MBE process exhibits mixed-crystal ratio and film thickness controllability, excellent reproducibility and uniformity are obtained when forming the double-hetero structure on a compound semiconductor substrate. Since the growth process takes place under thermal non-equilibrium, the amount of impurity doping is raised to more than 1019 cm3. This is advantageous in terms of forming an electrode contact layer. With the LPE process, the material dissolved in the melt is grown epitaxially on the substrate by slow cooling, and the rate of growth is high. This process is suitable for forming the substrate after removal of the compound semiconductor substrate. By virtue of this liquid phase epitaxy, an oxide film preventing layer is removed by raising the degree of unsaturation of the melt, the epitaxial layer is grown in a short period of time, and a high-quality, highly uniform epitaxial substrate can be quickly manufactured. It is also possible to reduce cost.
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Citations
9 Claims
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1. An epitaxial substate for a high-intensity LED, comprising:
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a double-hetero structure epitaxial layer formed by vapor phase epitaxy; and an epitaxial layer formed by liquid phase epitaxy on said double-hetero structure epitaxial layer; said double-hetero structure epitaxial layer being formed by removing a compound semiconductor substrate after said double-hetero structure epitaxial layer has been formed thereon. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of manufacturing an epitaxial substrate for a high-intensity LED, comprising:
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a first step of growing an epitaxial layer on a compound semiconductor substrate by vapor phase epitaxy; a second step of forming an anti-oxidation layer on the epitaxial layer; a third step of forming an epitaxial layer on the anit-oxidation layer; and a fourth step of removing the compound semiconductor substrate. - View Dependent Claims (8, 9)
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Specification