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Wide area soft vacuum abnormal glow electron beam discharge hardening process

  • US 4,904,866 A
  • Filed: 11/17/1988
  • Issued: 02/27/1990
  • Est. Priority Date: 11/17/1988
  • Status: Expired due to Fees
First Claim
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1. A resist hardening process for hardening a previously patterned resist layer on a substrate, the process comprising:

  • positioning a substrate having a previously patterned resist layer thereon in a vacuum chamber;

    evacuating the vacuum chamber with a selected gas to a selected pressure level;

    producing a wide area pulsed abnormal glow electron beam discharge from a cold cathode abnormal glow discharge electron gun positioned within the vacuum chamber, said pulsed abnormal glow electron beam discharge being pulsed from a first current level to a higher second current level; and

    exposing the previously patterned resist layer on the substrate to the wide area pulsed abnormal glow electron beam discharge for a predetermined number of pulses.

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