Magnetoelectric transducer
First Claim
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1. A compound semiconductor magnetoelectric transducer comprising:
- a substrate and an organic insulating layer overlaying said substrate;
a group III-V compound semiconductor layer of 0.1 to 10μ
m thickness disposed on said substrate and having a predetermined pattern to provide a magnetic field sensing portion;
a plurality of electrodes each formed of a laminated stack of three metal layers;
the first metal layer of said laminated stack being continuous to and in ohmic contact with said semiconductor layer and made of a material selected from the group consisting of Cu, Au, Au alloys and Au-Ge alloys;
the intermediate layer of said laminated stack providing a mechanical strength above a predetermined value and being formed on said first metal layer and made of a material selected from the group consisting of Ni, Cu and their alloys;
the third layer of said laminated stack being provided for wire bonding and being formed on said intermediate layer and made of Au; and
said first metal layer, said intermediate metal layer and said third layer each having a thickness of between about 2-5 μ
m.
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Abstract
A magnetoelectric transducer comprising a group III-V compound semiconductor thin film 14 of 0.1 μm to 10 μm thickness formed as a magnetic field sensing portion on a substrate 12 overlaying an organic insulating layer 13, and a multilayer wire bonding electrode including an ohmic electrode 16 formed on a required area of the thin film and a hard metal layer 17 and a bonding layer 18 which are laminated on the ohmic electrode.
111 Citations
8 Claims
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1. A compound semiconductor magnetoelectric transducer comprising:
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a substrate and an organic insulating layer overlaying said substrate; a group III-V compound semiconductor layer of 0.1 to 10μ
m thickness disposed on said substrate and having a predetermined pattern to provide a magnetic field sensing portion;a plurality of electrodes each formed of a laminated stack of three metal layers; the first metal layer of said laminated stack being continuous to and in ohmic contact with said semiconductor layer and made of a material selected from the group consisting of Cu, Au, Au alloys and Au-Ge alloys; the intermediate layer of said laminated stack providing a mechanical strength above a predetermined value and being formed on said first metal layer and made of a material selected from the group consisting of Ni, Cu and their alloys; the third layer of said laminated stack being provided for wire bonding and being formed on said intermediate layer and made of Au; and said first metal layer, said intermediate metal layer and said third layer each having a thickness of between about 2-5 μ
m. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification