Anti-reflective coating

• US 4,910,122 A
• Filed: 08/06/1984
• Issued: 03/20/1990
• Est. Priority Date: 09/30/1982
• Status: Expired due to Term

• Current Assignee: Brewer Science Inc.
• Original Assignee: Brewer Science Inc.
• Inventors: Arnold, John W., Punyakumleard, Sumalee, Brewer, Terry L.
• Primary Examiner(s): Dees, Jose G.
• Application Number:
  US06/638,258
• Time in Patent Office: 2,052 Days
• Field of Search: 430/271, 430/311, 430/312, 430/313, 430/319, 430/299, 430/317, 430/327, 430/329, 430/318
• US Class Current: 430/313
• CPC Class Codes: G03F 7/091 characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
• CPC Class Codes: H01L 21/0276 using an anti-reflective coating anti-reflective coating for lithography in general G03F7/09
• CPC Class Codes: Y10S 438/952 Utilizing antireflective layer

Abstract

A light absorbing medium to be interposed under photosensitive layers, such as a photo-resist for integrated circuit "chips" to eliminate defects caused by reflected light, has a polymer vehicle which can penetrate into small depressions of a substrate and form a thin, smooth and uniform coating. The coating includes a light absorbing dye. This light absorbing layer is imageable in the process. The light absorbing material eliminates many of the defects caused by reflected light resulting in increased sharpness of the images in the photo-resist. The material reduces the losses due to defects and increases the yield of useable product.

Claims

1. In a process of making integrated circuit elements by photolithography the improvement comprising, applying a light absorbing, imageable, anti-reflective coating to an integrated circuit element substrate and overcoating the substrate and anti-reflective coating with a photoresist, subsequently imaging a pattern in the photoresist and anti-reflective coating layers, the anti-reflective layer imaging with the photoresist, developing and removing the developed image from the photoresist and anti-reflective coating layers, the imaged anti-reflective layer developing with and being removed with the photoresist, and etching a pattern defined by the imaged photoresist and anti-reflective coating layers into the substrate to produce an integrated circuit element, the anti-reflective coating having a dye and vehicle combination effective to reproducably form a tightly bonded, uniform, anti-reflective coating and a sharp, substantially completely removable image on the substrate and being effective at the wave length of the exposing light to substantially eliminate the effect of reflected light and produce clear, sharply defined etched structures in the substrate.

2. The method of claim 1, wherein the photoresist and anti-reflective layer are simultaneously imaged.

3. The method of claim 1, wherein the photoresist and anti-reflective layer are developed simultaneously.

4. The method of claim 1, wherein the anti-reflective coating layer is a thin, uniform layer.

5. The method of claim 1, wherein the anti-reflective coating layer is effective to substantially eliminate the standing wave effect of reflected light.

6. The process of claim 1, wherein the anti-reflective coating comprises a dye and vehicle combination in a solvent, the combination being effective, when applied to an integrated circuit element, of producing a tightly bonded, uniform, anti-reflective coating, and when coated with a photoresist and exposed to light of a wave-length sufficient to image the photoresist, being effective to produce a sharp, substantially completely removable image on the substrate, the anti-reflective coating being developable and removable with the photoresist and when developed and removed from the substrate being effective to substantially eliminate the effect of reflected light and producing clear, sharply defined images in the substrate.

7. The process of claim 6 wherein the solvent is selected from one or more of the group consisting of alcohols, aromatic hydrocarbons, ketones and ester solvents having a low surface (interfacial) energy, and combinations thereof.

8. The process of claim 6 wherein the coating material is a wet etchable coating material having a solvent selected from one or more of the group consisting of alcohols, aromatic hydrocarbons, ketones, and ester solvents having a low surface (interfacial) energy, and combinations thereof, wherein the vehicle is selected from one or more of the group consisting of polymers and copolymers of polyamic acids which are readily soluble in the solvent, and combinations of the polyamic acid polymers and copolymers with water soluble polymers and copolymers, and wherein the dye is selected from one or more of the group consisting of curcumin and its derivatives and bixin and its derivatives, the anti-reflective coating material being effective to produce a thin, uniform, tightly bonded coating substantially free of defects over an integrated circuit substrate and the like having an uneven surface topography of dimensions approximating that of the wavelength of the exposing light used in the attendant photolithographic process.

9. In a process of making integrated circuit elements by photolithography the improvement comprising applying a light absorbing anti-reflective coating to an integrated circuit element substrate, the anti-reflective coating having a vehicle selected from the group consisting of plasma degradable polymers and copolymers of sulfur dioxide, and overcoating the anti-reflective coating with an adjacent photoresist layer, subsequently imaging a pattern in the photoresist, developing the imaged pattern and removing the developed photoresist, and dry etching the imaged pattern into the anti-reflective coating layer and the substrate to produce an integrated circuit element.

10. The method of claim 9 wherein the image is transferred to the anti-reflective layer by dry etching the developed imaged pattern and the pattern is subsequently etched into the substrate.

11. In a process of making integrated circuit elements by photolithography the improvement comprising, applying a light absorbing, imageable, anti-reflective coating to an element substrate, overcoating the substrate anti-reflective coating with a photoresist, and producing an etched integrated circuit element from the coated substrate by photolithography, the anti-reflective coating simultaneously imaging with the photoresist and having a dye and vehicle combination effective to reproducably form a tightly bonded, uniform coating and a sharp, substantially completely removable image on the substrate and being effective at the wave length of the exposing light to substantially eliminate reflected light and produce clear, sharply defined etched structures in the substrate.

12. In a process of making integrated circuit elements by photolithography, the improvement comprising, applying a light absorbing, imageable, anti-reflective coating to an element substrate and overcoating the substrate and anti-reflective coating with a photoresist, subsequently imaging a pattern in the photoresist and the anti-reflective coating layers, simultaneously developing the imaged anti-reflective and photoresist layers, etching a pattern defined by the imaged photoresist and anti-reflective coating into the substrate and removing the photoresist and anti-reflective coating layers to produce an integrated circuit element, the anti-reflective coating having a dye and vehicle combination effective to reproducably form a tightly bonded, uniform coating and a sharp, substantially completely removable image on the substrate and being effective at the wave length of the exposing light to substantially eliminate reflected light and produce clear, sharply defined etched structures in the substrate.

13. In a process of making integrated circuit elements by photolithography the improvement comprising, applying a thin layer of a light absorbing, imagable, anti-reflective coating to an element substrate, overcoating the substrate and anti-reflective coating with a photoresist, and producing an etched integrated circuit element from the coated substrate by photolithography, the anti-reflective coating having a dye and vehicle combination in a solvent, the combination being effective, when applied to a integrated circuit element, to reproducably form a thin, tightly bonded, uniform coating layer over a substrate surface typography of a magnitude approximating that of the wave length of the light used in the photolithographic process, the coating being effective when exposed to light of a wave length sufficient to image the photoresist, of producing a sharp, substantially completely removable image on the substrate and when developed and removed from the substrate being effective to substantially eliminate the standing wave effect of reflected light and produce clear, sharply defined etched structures in the substrate, the dye being selected from one or more of the group consisting of curcumin and its derivatives and bixin and its derivatives and combinations thereof.

14. In a process of making integrated circuit elements by photolithography the improvement comprising, applying a thin layer of a light absorbing, imagable, anti-reflective coating to an element substrate, overcoating the substrate and anti-reflective coating with a photoresist, and producing an etched integrated circuit element from the coated substrate by photolithography, the anti-reflective coating having a dye and vehicle combination in a solvent, the combination being effective, when applied to a integrated circuit element, to reproducably form a thin, tightly bonded, uniform coating layer over a substrate surface typography of a magnitude approximating that of the wave length of the light used in the photolithographic process, the coating being effective when exposed to light of a wave length sufficient to image the photoresist, of producing a sharp, substantially completely removable image on the substrate and when developed and removed from the substrate being effective to substantially eliminate the standing wave effect of reflected light and produce clear, sharply defined etched structures in the substrate, the vehicle being selected from one or more of the group consisting of readily soluble polymers and copolymers of polyamic acids and combinations thereof with water soluble polymers and copolymers.