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Wiring method for semiconductor integrated circuit

  • US 4,910,680 A
  • Filed: 03/25/1988
  • Issued: 03/20/1990
  • Est. Priority Date: 03/26/1987
  • Status: Expired due to Term
First Claim
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1. An automatic wiring method for a semiconductor integrated circuit device in which function blocks selected to provide desired logic functions are arranged in the surface area of a substrate surrounded by input/output circuit blocks provided on the peripheral portion of said substrate and divided channels functioning as wiring regions are formed around said function blocks, said method comprising the steps of:

  • (a) sequentially processing said channels for wiring in a predetermined processing order to form a channel wiring pattern by determining electrical connecting paths between said function blocks associated with a corresponding one of said channels sequentially selected to satisfy the requirement for the wiring in the selected channel;

    (b) completing the wiring process for internal channels among said channels except peripheral channels which are in direct contact with said input/output circuit blocks, and then merging said peripheral channels to form a rectangular ring-form channel region;

    (c) developing said ring-form channel region in a one-dimensional fashion to form a linear channel region;

    (d) processing said linear channel region for wiring to determine a wiring pattern for said linear channel region; and

    (e) reforming said wiring pattern to be suited for said ring-form channel region.

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