Electro-optical device with inverted transparent substrate and method for making same

• US 4,912,532 A
• Filed: 08/26/1988
• Issued: 03/27/1990
• Est. Priority Date: 08/26/1988
• Status: Expired due to Term

• Current Assignee: Philips Lumileds Lighting Company LLC (Apollo Global Management, Inc.)
• Original Assignee: Hewlett-Packard Company (HP Inc.)
• Inventors: Camras, Michael D., Cook, Louis W.
• Primary Examiner(s): NOT, DEFINED
• Application Number:
  US07/237,797
• Time in Patent Office: 578 Days
• Field of Search: 357/17, 357/30 B, 357/30 E, 357/63, 357/64, 357/16, 357/52
• US Class Current: 257/94
• CPC Class Codes: H01L 33/0025 comprising only AIIIBV compounds
• CPC Class Codes: H01L 33/0062 for devices with an active region comprising only III-V compounds

Abstract

An electro-optical device with a transparent substrate is produced by epitaxially first growing the device layers, followed by that of the transparent substrate layer on an opaque wafer. The opaque wafer is subsequently removed. The device layers have dopants with sufficient low diffusivities that their electronic characteristics are not adversely affected by long exposure to elevated temperature during the growth of the transparent substrate layer. In a liquid phase epitaxy (LPE) method, a repeated temperature cycle technique is used where the temperature is repeatedly raised up each time after cooling to provide a large cooling range for growing a sufficiently thick substrate layer or a series of device layers. In between growths and during the temperature heat-up periods, the device is stored within the LPE reactor. In other embodimens, the device is either temporarily removed from the LPE reactor or is transferred to another reactor. When a epitaxial layer is oxidizable, a non-oxidizable cap is temporarily grown on it in between growths and during the temperature heat-up periods. The cap is subsequently removed by melting back at an elevated temperature just prior to the growth of a next layer.

Claims

1. An electro-optical device comprising:

a section which converts electrical current to light or light to electrical current, said section including a semiconductor material doped with a dopant which has a diffusivity smaller than that of zinc; and

a substrate adjacent to the section, said substrate being substantially transparent to the light to be converted or emitted by the section, said substrate and the section having been grown epitaxially from a substrate which is opaque to the light to be converted or emitted by the section, wherein the section is grown before the transparent substrate and the opaque substrate is sequently removed, the dislocation density in the section being less than the dislocation density in the transparent substrate.

2. The device of claim 1, wherein said section is a light emitting diode including a first p-type layer and a second n-type layer adjacent to each other, the band gaps of the two layers being such that the p-type layer emits light by converting electrical current to light, said p-type layer being doped with the dopant.

3. The device of claim 2, wherein said section includes a second p-type layer adjacent to the first p-type layer, said first and second p-type layers forming another heterojunction so that the device is a double heterostructure.

4. The device of claim 1, wherein said opaque substrate is composed of GaAs, and the section and transparent substrate composed of AlGaAs.

5. The device of claim 4, said device having been grown by a liquid phase epitaxial process wherein AlGaAs is epitaxially grown onto the opaque substrate to form the device, wherein the aluminum content in the substrate decreases in the growth direction.

6. The device of claim 1, wherein said dopant is magnesium.

7. The device of claim 1, wherein said opaque substrate is composed of GaAs, and the section and the transparent substrate composed of AlInGaP.

8. The device of claim 1, wherein the opaque substrate has a dislocation density less than about 10⁵ /sq.cm.

9. An electro-optical device comprising:

an epitaxially grown active section which converts electrical current to light or light to electrical current; and

an epitaxially grown substrate adjacent to the active section, the substrate being substantially transparent to the light to be converted or emitted by the active section and having more imperfections than the active section.

10. The device of claim 9 wherein said active section is a light-emitting diode including a first p-type layer and a second n-type layer adjacent to each other, the band gaps of the two layers being such that the p-type layer emits light by converting electrical current to light.

11. The device of claim 10 wherein said section includes a second p-type layer adjacent to the first p-type layer, said first and second p-type layers forming another heterojunction so that the device is a double heterostructure.