Two-layer system
First Claim
1. In a radiation-curable two-layer system comprising a layer containing polymerization photoinitiator and applied to a substrate, and a second layer containing photopolymerizable compounds superposed on said first layer, the improvement wherein said photoinitiator is immobilized on a macrostructure and attached to a polymer matrix by a covalent bond and wherein said photoinitiator is of the formulaAr--CO--RwhereinAr is ##STR3## R is Ar or CR2 R3 R4, R1 is H, halogen, C1 -C12 -alkyl, C1 -C12 -alkoxy, C1 -C12 -alkylthio or A,R2 and R3 independently of one another are each H, C1 -C6 -alkyl or phenyl, or one of R2 and R3 is C1 -C6 -alkylene-O-A, or R2 and R3 together are C2 -C6 -alkylene or C1 -C6 -oxaalkylene,R4 is OR5, N(R5)2, SR5, or A,R5 is H, C1 -C6 -alkyl or C1 -C6 -alkanoyl,A is ##STR4## X is O, NH OR (C1 -C6 -alkyl)--N, Y is O, N or S,Z is in each case independently of one another H or CH3,m is 0 to 4 andn is 2 to 106,subject to the proviso that said initiator contains at least one radical of the formula A.
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Accused Products
Abstract
Radiation-curable two-layer systems containing immobilized photoinitiators are suitable for the production of coatings of constant thickness and good adhesion, and relief structures of high resolution and edge steepness.
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Citations
5 Claims
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1. In a radiation-curable two-layer system comprising a layer containing polymerization photoinitiator and applied to a substrate, and a second layer containing photopolymerizable compounds superposed on said first layer, the improvement wherein said photoinitiator is immobilized on a macrostructure and attached to a polymer matrix by a covalent bond and wherein said photoinitiator is of the formula
Ar--CO--R wherein Ar is ##STR3## R is Ar or CR2 R3 R4, R1 is H, halogen, C1 -C12 -alkyl, C1 -C12 -alkoxy, C1 -C12 -alkylthio or A, R2 and R3 independently of one another are each H, C1 -C6 -alkyl or phenyl, or one of R2 and R3 is C1 -C6 -alkylene-O-A, or R2 and R3 together are C2 -C6 -alkylene or C1 -C6 -oxaalkylene, R4 is OR5, N(R5)2, SR5, or A, R5 is H, C1 -C6 -alkyl or C1 -C6 -alkanoyl, A is ##STR4## X is O, NH OR (C1 -C6 -alkyl)--N, Y is O, N or S, Z is in each case independently of one another H or CH3, m is 0 to 4 and n is 2 to 106, subject to the proviso that said initiator contains at least one radical of the formula A.
Specification
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- Resources
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Current AssigneeCiba Specialty Chemicals Corp (BASF SE)
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Original AssigneeMerck Patent GmbH (Merck & Co., Inc.)
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InventorsPoetsch, Eike, Dorsch, Dieter, Eidenschink, Rudolf, Kohler, Manfred, Ohngemach, Jorg, Greber, Gerhard
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Primary Examiner(s)Martin, Roland E.
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Assistant Examiner(s)Hamilton, Cynthia
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Application NumberUS07/090,283Time in Patent Office949 DaysField of Search522/904, 522/905, 522/35, 522/71, 430/271, 430/273, 430/272, 430/275, 502/5, 502/522US Class Current430/272.1CPC Class CodesG03F 7/095 having more than one photos...Y10S 502/522 Radiant or wave energy acti...Y10S 522/904 Monomer or polymer contains...Y10S 522/905 Benzophenone group
