System for manufacturing semiconductor under clean condition

• US 4,923,352 A
• Filed: 12/29/1988
• Issued: 05/08/1990
• Est. Priority Date: 03/31/1988
• Status: Expired due to Term

• Current Assignee: Kabushiki Kaisha NMB
• Original Assignee: Kabushiki Kaisha NMB Semiconductor
• Inventors: Tamura, Takumi, Okashita, Kyohiko, Shinoda, Shosuke, Yamashita, Tetsuo
• Primary Examiner(s): Spar, Robert J.
• Assistant Examiner(s): Underwood, Donald W.
• Application Number:
  US07/291,757
• Time in Patent Office: 495 Days
• Field of Search: 414/225, 414/226, 414/222, 414/217, 414/231, 414/939, 414/940, 98/115.3, 98/31.5, 29/722
• US Class Current: 414/225.01
• CPC Class Codes: B25J 21/005 Clean rooms
• CPC Class Codes: H01L 21/67772 involving removal of lid, door, cover
• CPC Class Codes: H01L 21/67775 Docking arrangements
• CPC Class Codes: Y10S 414/139 including wafer charging or discharging means for vacuum chamber
• CPC Class Codes: Y10S 414/14 Wafer cassette transporting
• CPC Class Codes: Y10T 29/53096 including means to provide a controlled environment

Abstract

In semiconductor production plants a highly clean state is required. In a plant building, through which air is forcibly circulated, a clean room in a low or medium cleanliness state is formed using a filter. A plurality of processing units are provided in the clean room and held in a high cleanliness state. A transport robot transfers a workpiece or like object to and from each processing unit. The robot is capable of being driven to positions corresponding to the processing units and holds the workpiece or object in a highly clean state. Thus, there is no need of holding the entire building highly clean, and only a required part of the building may be held in a highly clean state, which is advantageous from the standpoint of cost.

Claims

1. A system for manufacturing semiconductors under clean conditions comprising:

a clean room having a floor, a ceiling and walls, said clean room being provided in a space surrounded by outer walls of a building, said clean room separating said space into a plurality of air circulating paths, said air circulating paths being disposed below, above and on the sides of the clean room;

means for vertically partitioning said clean room into a medium cleanliness room and a high cleanliness room, said medium cleanliness room being cleaner than the space and the high cleanliness room being cleaner than the medium cleanliness room;

first and second filters provided on the ceiling of the medium cleanliness room and the high cleanliness room, respectively, said first and second filters purifying the air flowing from the above air circulating path into the medium cleanliness room and the high cleanliness room;

first and second exhausting openings provided at the floor of the medium cleanliness room and the high cleanliness room respectively for exhausting the air from said medium cleanliness room and said high cleanliness room into the below air circulating path;

a first air-blower provided in the air circulating path on the side of said clean room;

a third filter provided on a boundary between the air circulating path on the side of the clean room and the below air circulating path;

a processing unit in the high cleanliness room;

transport means for transporting workpieces comprising a robot having an accomodating carrier for avoiding dust and holding the workpieces and having a robot arm for moving said workpieces, which is disposed movably in the medium cleanliness room;

a fourth filter provided on the ceiling of the accommodating carrier avoiding the dust, said fourth filter purifying the air flowing from the medium cleanliness room into said accommodating carrier; and

communicating means to communicate between said medium cleanliness room and said high cleanliness room wherein said communicating means comprises an opening in said partitioning means for use of the robot arm through which a workpiece is transported to and from between the accommodating carrier and the processing unit.

2. A system as claimed in claim 1, wherein said first and second filters each have a mesh size, the mesh size of the filters of the medium cleanliness room and the high cleanliness room, respectively, being different from each other.

3. A system as claimed in claim 1 wherein the clean room is further partitioned by said vertical partitioning means forming a highest cleanliness room, disposed within the high cleanliness room and between the high cleanliness room and the medium cleanliness room accommodating workstations and further comprising a fifth filter provided on an upper part of the highest cleanliness room and a third exhausting opening provided at a lower part of the highest cleanliness room so as to circulate the air of the high cleanliness room by means of a second air blower to the highest cleanliness room.

4. A system as claimed in claim 2, wherein the clean room is further partitioned by said vertical partitioning means forming a highest cleanliness room disposed within the high cleanliness room and between the high cleanliness room and the medium cleanliness room accommodating workstations and further comprising a fifth filter provided on an upper part of the highest cleanliness room and a third exhausting opening provided at a lower part of the highest cleanliness room so as to circulate the air of the high cleanliness room by means of a second air blower to the highest cleanliness room.