Sealing apparatus for a vacuum processing system

• US 4,923,584 A
• Filed: 10/31/1988
• Issued: 05/08/1990
• Est. Priority Date: 10/31/1988
• Status: Expired due to Fees

• Current Assignee: Eaton Corporation Eaton Center Cleveland 44114
• Original Assignee: Eaton Corp. (Wisconsin) (Eaton Corporation PLC.)
• Inventors: Bramhall, Robert B. Jr., Laber, Albert P., Muka, Richard S., Cloutier, Richard M.
• Primary Examiner(s): Bueker, Richard
• Assistant Examiner(s): Owens, Terry J.
• Application Number:
  US07/264,592
• Time in Patent Office: 554 Days
• Field of Search: 118/50.1, 118/500, 118/715, 118/719, 118/728, 118/729, 118/733, 156/345, 156/643, 204/192.12, 204/192.32, 204/298 EM, 204/298 MC, 204/298 MD, 414/217, 414/222, 414/225, 414/331, 414/416, 414/417, 414/778, 414/783, 24/495
• US Class Current: 204/298.25
• CPC Class Codes: H01L 21/67126 Apparatus for sealing, encapsulating, glassing, decapsulating or the like processes H01L23/02, H01L23/28
• CPC Class Codes: H01L 21/67748 horizontal transfer of a single workpiece
• CPC Class Codes: H01L 21/67751 vertical transfer of a single workpiece
• CPC Class Codes: H01L 21/68707 the wafers being placed on a robot blade, or gripped by a gripper for conveyance
• CPC Class Codes: Y10S 414/139 including wafer charging or discharging means for vacuum chamber
• CPC Class Codes: Y10S 414/141 includes means for gripping wafer

Abstract

A sealing arrangement for a vacuum processing system for semiconductor wafers which is effective to apply a sealing force to a valve element (66) between chambers of the processing system. The valve element is defined by a platen which holds wafers (30) for transfer between a horizontal receiving position within a staging chamber (14) to a vertical position within a processing chamber (16-19). The sealing arrangement includes a pair of toggle mechanisms (268) which are manually operable from outside the staging chamber and which, in conjunction with the closing force applied by the platen operating mechanism (165) are effective to maintain vacuum integrity within the staging chamber when the process chamber is at atmospheric pressure or removed for servicing.

Claims

1. An apparatus for the vacuum processing of semiconductor wafers comprising a first chamber;

a second chamber adjacent the first chamber;

a wall separating said first chamber from said second chamber, said wall having an aperture formed therein providing communication between said first and second chambers; and

a valve element engageable with said wall over said aperture and being operable to selectively open and close communication between said first and second chambers;

means applying a closing force to said valve element against said wall, said force applying means comprising a ramp element fixed to said valve element; and

clamp means acting against said ramp element, said clamp means including a contact element movable along said ramp in a direction wherein said contact element is operable to apply an increasing closing force component to said valve element as said contact element moves along said ramp element, and means for moving said contact element along said ramp element.

2. Apparatus as claimed in claim 1 in which said means for moving said contract element comprises an actuating mechanism mounted on a wall of said first chamber and operable to move said contract between a first position out of engagement with said ramp element and a plurality of second positions in contract with the surface of said ramp element.

3. Apparatus as claimed in claim 2 in which said actuating mechanism comprises a housing mounted outside said first chamber, and rotary-to-linear actuator means supported on said housing and operatively connected to said contract element.

4. Apparatus as claimed in claim 3, in which said rotary-to-linear actuator means comprises a nut supported for rotation on said housing, a threaded member received in said nut and operatively connected to said contact element, and means for rotating said nut.

5. Apparatus as claimed in claim 4 in which said means for moving said contact element includes a support member fixed to a wall of said first chamber, means pivotally supporting said contact element on said support member and link means pivotally connected to said threaded member and to said contact element.

6. Apparatus as claimed in claim 4, in which said means for rotating said nut comprises manually operable means attached to said nut.

7. Apparatus as claimed in claim 1, in which said contact element comprises a roller engageable with said ramp element.

8. Apparatus as claimed in claim 1 including resilient seal means received between said valve element and said wall separating said first chamber from said second chamber.

9. Apparatus as claimed in claim 4 including static seal means acting between said threaded member and the wall on which said linear actuator means is mounted.

10. Apparatus as claimed in claim 9, in which said static seal means comprises a bellows surrounding said threaded member, said bellows being attached at one end to said threaded member and at its opposite end to said housing.

11. Apparatus as claimed in claim 8 in which said means applying a closing force to said valve element is effective to seal said first chamber from said second chamber when said first chamber is at a pressure no less than 10^-7 torr and said second chamber is at essentially atmospheric pressure.

12. Apparatus as claimed in any one of claims 1 to 11 including means mounting said valve element for pivotal movement between a first position out of engagement with said wall separating said first chamber from said second chamber and a second position in sealing engagement with said wall separating said first chamber from said second chamber, and means moving said valve between said first position and said second position, whereby said moving means provides a first sealing force component to said valve element against said wall and said means applying a closing force applies a second sealing force component to said valve element against said wall.

13. Apparatus as claimed in claim 12 in which said means mounting said valve element comprises a shaft fixed to said valve element and extending outward of said first chamber;

and said means for moving said valve element comprises a lever arm fixed to said shaft, and a linear actuator having an output member attached to said lever arm.

14. Apparatus as claimed in any one of claims 1 to 11, in which said valve element defines platen means extending through said aperture and including means to hold semiconductor wafers thereon for exposure to a processing atmosphere within said second chamber.

15. Apparatus as claimed in claim 12 in which said valve element defines platen means extending through said aperture and including means to hold semiconductor wafers thereon for exposure to a processing atmosphere within said second chamber.