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Sealing apparatus for a vacuum processing system

  • US 4,923,584 A
  • Filed: 10/31/1988
  • Issued: 05/08/1990
  • Est. Priority Date: 10/31/1988
  • Status: Expired due to Fees
First Claim
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1. An apparatus for the vacuum processing of semiconductor wafers comprising a first chamber;

  • a second chamber adjacent the first chamber;

    a wall separating said first chamber from said second chamber, said wall having an aperture formed therein providing communication between said first and second chambers; and

    a valve element engageable with said wall over said aperture and being operable to selectively open and close communication between said first and second chambers;

    means applying a closing force to said valve element against said wall, said force applying means comprising a ramp element fixed to said valve element; and

    clamp means acting against said ramp element, said clamp means including a contact element movable along said ramp in a direction wherein said contact element is operable to apply an increasing closing force component to said valve element as said contact element moves along said ramp element, and means for moving said contact element along said ramp element.

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