Abrasion-resistant plastic articles and method for making them

• US 4,927,704 A
• Filed: 04/11/1989
• Issued: 05/22/1990
• Est. Priority Date: 08/24/1987
• Status: Expired due to Term

• Current Assignee: Sabic Innovative Plastics IP BV (Government of Saudi Arabia)
• Original Assignee: General Electric Company
• Inventors: Reed, Clive W., Rzad, Stefan J., Devins, John C.
• Primary Examiner(s): PIANALTO, BERNARD D
• Application Number:
  US07/336,277
• Time in Patent Office: 406 Days
• Field of Search: 427/38, 427/255.3, 427/44, 427/255.6, 427/255.7, 428/221, 428/447, 428/698, 428/702, 428/704
• US Class Current: 428/221
• CPC Class Codes: B05D 1/62 Plasma-deposition of organic layers plasma deposition in general C23C14/00, C23C16/00
• CPC Class Codes: C08J 7/123 Treatment by wave energy or particle radiation C08J7/18 takes precedence
• CPC Class Codes: C23C 16/308 Oxynitrides
• CPC Class Codes: C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
• CPC Class Codes: Y10T 428/249921 Web or sheet containing structurally defined element or component
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane

Abstract

An abrasion-resistant article and method for making is disclosed. The article includes a plastic substrate and a gradational coating applied by plasma-enhanced chemical vapor deposition to the surface thereof.

Claims

1. A method for preparing an abrasion-resistant plastic article, comprising plasma-enhanced chemical vapor deposition of an abrasion-resistant gradational layer onto a plastic substrate, wherein the composition of the gradational layer changes gradually in a direction perpendicular to the substrate surface from a composition consisting essentially of an interfacial material selected from the group consisting of organosilicon, organometallic, acrylic, and polyolefin materials, to a composition consisting essentially of an abrasion-resistant material selected from the group consisting of silicon dioxide, silicon nitride, silicon oxynitride, silicon carbide, silicon carbonitride, boron oxide, boron nitride, aluminum oxide, aluminum nitride, titanium dioxide, tantalum oxide, iron oxide, germanium oxide, germanium carbide, and mixtures thereof.

2. The method of claim 1 wherein the interfacial material is formed by polymerizing an olefinic monomer in the plasma.

3. The method of claim 1 wherein the interfacial material is formed by polymerizing an acrylic monomer in the plasma.

4. The method of claim 1 wherein the interfacial material is formed by polymerizing an organosilicon monomer vapor in the plasma.

5. The method of claim 4 wherein the organosilicon monomer is selected from the group consisting of hexamethyldisilazane, hexamethyldisiloxane, vinyl trimethylsilane, and octamethylcyclotetrasiloxane.

6. The method of claim 5 wherein the abrasion-resistant material is selected from the group consisting of silicon carbide, silicon dioxide, silicon nitride, silicon oxynitride, and mixtures thereof.

7. The article produced by applying the abrasion-resistant coating of claim 1 on a plastic substrate.

8. The method of claim 1 wherein the coating is deposited onto a polycarbonate substrate.

9. The method of claim 8 wherein a primer is applied to the polycarbonate substrate prior to the plasma-enhanced chemical vapor deposition.

10. The method of claim 1 wherein the plasma-enhanced chemical vapor deposition comprises passing a feed composition of gradational layer precursors into a reactor chamber in a laminar flow relative to a substrate surface situated therein while generating an electrical field in the chamber to form a plasma of the precursors, each of which reacts in the plasma and on the underlying surface to form the gradational layer.

11. The method of claim 10 wherein the laminar flow is characterized by a Reynolds value of about 2.5.

12. The method of claim 10 wherein the deposition is carried out by:

(I) passing the interfacial material precursor into the reactor chamber for a preselected time in the absence of abrasion-resistant material precursors, followed by

(II) changing the feed composition by controlled adjustment means from the interfacial material precursor to the abrasion-resistant material precursor over a preselected time period, and then

(III) passing the abrasion-resistant material precursor into the reactor chamber in the absence of interfacial material precursors for a preselected time.

13. The method of claim 12 wherein the feed composition in step (II) is changed linearly from the interfacial material precursor to the abrasion-resistant material precursor.

14. The method of claim 12 wherein the feed composition in step (II) is changed exponentially from the interfacial material precursor to the abrasion-resistant material precursor.

15. The method of claim 12 wherein each gaseous reactant is passed into the chamber mixed with a carrier gas which flows at a constant rate throughout said plasma deposition.

16. The method of claim 15 wherein the reactor chamber pressure is maintained at a constant value throughout said deposition.

17. The method of claim 16 wherein the plasma is formed by an electrical generator operating at a constant power value and frequency.

18. The method of claim 17 wherein the reactor chamber pressure is maintained at a value between about 50 millitorrs and about 10 Torrs;

and wherein the generator operates at dc or at ac frequencies of between about 50 kHz and about 10 GHz, and a power value of between about 10 watts and 5000 watts.

19. The method of claim 15 wherein the interfacial material precursor is an organosilicon compound;

the abrasion-resistant material precursors are nitrous oxide and silane; and

the carrier gas is helium.

20. The method of claim 19 wherein the organosilicon compound in step (I) has a flow rate ranging from about 5 sccm to about 250 sccm;

the silane in step (III) has a flow rate from about 10 sccm to about 100 sccm;

the nitrous oxide in step (III) has a flow rate of from about 300 sccm to about 5000 sccm; and

the helium flow rate is maintained at a constant value in the range between about 500 sccm and 5000 sccm;

the total gas flow in each of steps (I), (II) and (III) also being maintained at a constant value.

21. The method of claim 20 wherein the feed composition is changed exponentially from the interfacial material precursor to the abrasion resistant material precursor.

22. The method of claim 20 wherein the substrate is heated to a temperature between about room temperature and 130°

C.

23. The article produced by the method of claim 22.