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Pulsed plasma apparatus and process

  • US 4,935,661 A
  • Filed: 06/26/1986
  • Issued: 06/19/1990
  • Est. Priority Date: 06/29/1985
  • Status: Expired due to Term
First Claim
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1. An apparatus for plasma treatment of a substrate, including a radio frequency (RF) generator coupled inductively to a reactor chamber in which a substrate may be disposed, a pulse generator coupled to the RF generator whereby the output of the RF generator consists of a series of pulse of radio frequency energy, means for evacuating the reactor chamber, and mean for supplying active or inert gases to the reactor chamber in a pulsed manner, wherein the apparatus is such that the plasma is generated adjacent the substrate surface, and wherein the output power of the RF generator is sufficient to achieve full dissociation of the plasma adjacent the substrate providing an energy density of at least 100 watts per cubic centimeter within the plasma.

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