Optical interference filter
First Claim
1. An optical interference filter having an alternating sequence of first low-refractive index layers and second high-refractive index layers on a glass substrate, the first layers consisting essentially of amorphous SiO2 and the second layers being crystalline layers and consisting essentially of TiO2 and a second metal oxide, characterized in that the material of the second layers is a mixed oxide chosen from a group consisting of:
- 88-95 mole. % TiO2 and 5-12 mole. % ZrO2,88-95 mole. % TiO2 and 5-12 mole. % of an oxide selected from the group HfO2, TiO2.ZrO2, TiO2.HfO2, TiO2.Nb2 O5, TiO2.Ta2 O5 and Ta2 O5.2TiO2 and mixtures or combinations of these materials, the crystal structure of the second layers corresponding to a crystal structure obtained in a heat treatment at a temperature between 700° and
1100°
C.
1 Assignment
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Accused Products
Abstract
The optical interference filter is assembled from alternating amorphous SiO2 layers and layers made of mixed oxides chosen from
88-95 mole.% TiO2 and 5-12 mole.% ZrO2,
88-95 mole.% TiO2 and 5-12 mole.% HfO2,
TiO2 .ZrO2 .HfO2, TiO2 .Nb2 O5
TiO2 .Ta2 O5 and Ta2 O5 . 2TiO2.
The mixed oxides have a crystal structure which corresponds to the crystal structure obtained after a heat treatment between 700 and 1100° C. The filter is stable, also after a long period at an elevated temperature.
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Citations
8 Claims
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1. An optical interference filter having an alternating sequence of first low-refractive index layers and second high-refractive index layers on a glass substrate, the first layers consisting essentially of amorphous SiO2 and the second layers being crystalline layers and consisting essentially of TiO2 and a second metal oxide, characterized in that the material of the second layers is a mixed oxide chosen from a group consisting of:
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88-95 mole. % TiO2 and 5-12 mole. % ZrO2, 88-95 mole. % TiO2 and 5-12 mole. % of an oxide selected from the group HfO2, TiO2.ZrO2, TiO2.HfO2, TiO2.Nb2 O5, TiO2.Ta2 O5 and Ta2 O5.2TiO2 and mixtures or combinations of these materials, the crystal structure of the second layers corresponding to a crystal structure obtained in a heat treatment at a temperature between 700° and
1100°
C. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification