Wafer handling apparatus
First Claim
1. In apparatus for the vacuum processing of semiconductor wafers having a first chamber maintained under vacuum, a second chamber at substantially atmospheric pressure, and a plate member defining a boundary between said first chamber and said second chamber, the improvement comprising:
- apparatus for handling said wafers within said first chamber including a wafer receiving arm disposed within said first chamber, a drive shaft fixed to said from and extending from said first chamber into said second chamber, a flange member received in a hole formed in said plate member and in sealing engagement with said plate member, means mounting said shaft for linear movement relative to said flange member, said mounting means including frame means movable linearly with said shaft and supporting said shaft for rotary movement;
means operatively connected to said shaft to rotate said shaft and to move said shaft axially, rotary seal means engaging said shaft and being effective to maintain a seal between said first chamber and said second chamber when said shaft is rotated, and a bellows assembly in surrounding relation to said shaft and being effective to maintain a seal between said first chamber and said second chamber when said shaft is undergoing its axial movement, said bellows assembly comprising a first annular member having a flat surface formed thereon in engagement with a flat surface of said flange member, a second annular member having a flat surface formed thereon in engagement with a flat surface of said frame means, and a bellows fixed at one end to said first annular member and at its opposite end to said second annular member.
3 Assignments
0 Petitions
Accused Products
Abstract
A device (24) for handling semiconduct wafers in a vacuum which includes a wafer-receiving arm (80) located in a vacuum chamber and an operating shaft (76) which extends from the vacuum chamber into an atmospheric chamber. The shaft is driven in an axial direction by means of a motor-driven ball screw drive system (74) and angularly by a rotary motor (106) coupled directly to the shaft. The shaft is sealed to maintain vacuum integrity within the vacuum chamber by means of a FERROFLUIDIC rotary seal (110) and by a static seal in the form of a bellows assembly (111) which moves axially with the shaft.
102 Citations
6 Claims
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1. In apparatus for the vacuum processing of semiconductor wafers having a first chamber maintained under vacuum, a second chamber at substantially atmospheric pressure, and a plate member defining a boundary between said first chamber and said second chamber, the improvement comprising:
- apparatus for handling said wafers within said first chamber including a wafer receiving arm disposed within said first chamber, a drive shaft fixed to said from and extending from said first chamber into said second chamber, a flange member received in a hole formed in said plate member and in sealing engagement with said plate member, means mounting said shaft for linear movement relative to said flange member, said mounting means including frame means movable linearly with said shaft and supporting said shaft for rotary movement;
means operatively connected to said shaft to rotate said shaft and to move said shaft axially, rotary seal means engaging said shaft and being effective to maintain a seal between said first chamber and said second chamber when said shaft is rotated, and a bellows assembly in surrounding relation to said shaft and being effective to maintain a seal between said first chamber and said second chamber when said shaft is undergoing its axial movement, said bellows assembly comprising a first annular member having a flat surface formed thereon in engagement with a flat surface of said flange member, a second annular member having a flat surface formed thereon in engagement with a flat surface of said frame means, and a bellows fixed at one end to said first annular member and at its opposite end to said second annular member. - View Dependent Claims (2, 3)
- apparatus for handling said wafers within said first chamber including a wafer receiving arm disposed within said first chamber, a drive shaft fixed to said from and extending from said first chamber into said second chamber, a flange member received in a hole formed in said plate member and in sealing engagement with said plate member, means mounting said shaft for linear movement relative to said flange member, said mounting means including frame means movable linearly with said shaft and supporting said shaft for rotary movement;
- 4. An apparatus for processing semiconductor wafers comprising a stationary support plate, a linear bearing support fixed to said support plate, a frame disposed for linear movement relative to said support plate, linear bearing carriers fixed to said frame and mounted for linear movement on said linear bearing support, a shaft supported on said frame for rotation relative thereto and for linear movement therewith, a wafer handling arm fixed to an end of said shaft, a lead screw mounted for rotation on said support plate, a lead nut assembly attached to said frame and engaged with said lead screw, a rotary motor mounted on said support plate and operable to rotate said lead screw, second drive means mounted on said frame operable to rotate said shaft, a rotary seal mounted on said frame and in sealing contact with said shaft, and a bellows surrounding said shaft and operatively fixed to said support plate at one end and to said frame at its opposite end.
Specification