Magneto-optical recording element and method for fabrication thereof
First Claim
1. A method for the fabrication of a magneto-optical recording element, which comprises maintaining a substrate on which a film is to be formed, a first target composed of a sintered composition comprising (a) silicon nitride and (b) at least one additive selected from the group consisting of single elements, oxides, nitrides, sulfides and silicides of elements of the groups IIIa, IVa, IIb, IIIb, IVb and VIb of the Periodic Table and a second target composed of a magnetic layer-forming metal in an inert gas atmosphere maintained at 1×
- 10-3 to 50×
10-3 Torr and forming a magnetic layer and a dielectric layer alternately on the substrate by sputtering, wherein said additive (b) is contained in the first target in an amount of 4 to 20 mole %.
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Abstract
In a magneto-optical recording element comprising a substrate, a magnetic layer and a dielectric layer, the dielectric layer is formed by deposition of a composition comprising Si3 N4 and a refractive index-improving agent such as Al2 O3 or Y2 O3. This dielectric layer has a high refractive index and the enhancement effect is improved. Moreover, this dielectric layer is excellent in the adhesion and resistance characteristics.
27 Citations
12 Claims
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1. A method for the fabrication of a magneto-optical recording element, which comprises maintaining a substrate on which a film is to be formed, a first target composed of a sintered composition comprising (a) silicon nitride and (b) at least one additive selected from the group consisting of single elements, oxides, nitrides, sulfides and silicides of elements of the groups IIIa, IVa, IIb, IIIb, IVb and VIb of the Periodic Table and a second target composed of a magnetic layer-forming metal in an inert gas atmosphere maintained at 1×
- 10-3 to 50×
10-3 Torr and forming a magnetic layer and a dielectric layer alternately on the substrate by sputtering, wherein said additive (b) is contained in the first target in an amount of 4 to 20 mole %. - View Dependent Claims (2)
- 10-3 to 50×
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3. A method for fabrication of a magneto-optical recording element, the sequential steps of the method comprising:
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(a) providing a substrate on which a film is to be formed, a first target composed of a sintered composition comprising (i) silicon nitride and (ii) at least one additive selected from the group consisting of single elements, oxides, nitrides, sulfides, and silicides of elements of the groups IIIa, IVa, VIa, IIb, IIIb, IVb and VIb of the Periodic Table and a second target composed of a magnetic layer-forming metal, said additive (b) being contained in the first target in an amount of 4 to 20 mole %; (b) maintaining the substrate, the first target and the second target in an inert gas atmosphere maintained at 1×
10-3 to 50×
10-3 Torr;(c) applying a high-frequency electric power or direct current between the first target and the substrate to form a first dielectric layer; and (d) applying a high-frequency or direct current electric power between the second target and the substrate to form a magnetic layer. - View Dependent Claims (4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification