Flash evaporation of monomer fluids

• US 4,954,371 A
• Filed: 07/07/1987
• Issued: 09/04/1990
• Est. Priority Date: 06/23/1986
• Status: Expired due to Term

• Current Assignee: 3M Innovative Properties Company (3M Company)
• Original Assignee: Spectrum Control Incorporated (API Technologies Corporation)
• Inventors: Yializis, Angelo
• Primary Examiner(s): Bell, Janyce
• Application Number:
  US07/070,085
• Time in Patent Office: 1,155 Days
• Field of Search: 219/273, 219/275, 427/44, 427/54.1, 427/421, 427/255.6, 427/248.1, 427/80, 427/81, 427/127
• US Class Current: 427/497
• CPC Class Codes: B01D 1/16 by spraying B01D1/22 takes precedence
• CPC Class Codes: B01D 3/06 Flash distillation
• CPC Class Codes: B05D 1/60 Deposition of organic layers from vapour phase vapour phase deposition in general C23C14/00, C23C16/00
• CPC Class Codes: C23C 16/4486 by producing an aerosol and subsequent evaporation of the droplets or particles
• CPC Class Codes: H01G 4/145 vapour deposited

Abstract

A method for continuously supplying a uniform vapor of a polymerizable and/or cross-linkable material. A continuous liquid flow of said material is supplied at a temperature below both the decomposition temperature and the polymerization temperature of said material and atomized into a continuous flow of liquid droplets having a particle size from about 1 to about 50 microns. The droplets are continuously vaporized upon contact with a heated surface which is maintained at a temperature at or above the boiling point for said material, but below the temperature at which said droplets would undergo pyrolysis before vaporizing. The vapor may be deposited onto a substrate and subsequently polymerized or cross-linked.

Claims

1. A method for continuously supplying a uniform vapor of a polymerizable material, said method comprising:

supplying a continuous liquid flow of said material at a temperature below both the decomposition temperature and the polymerization temperature of said material;

continuously atomizing the liquid flow into a continuous flow of liquid droplets; and

continuously vaporizing said liquid droplets by causing said droplets to contact a heated surface which is maintained at a temperature at or above the boiling point for said material, but below the temperature at which said droplets would undergo pyrolysis before vaporizing.

2. A method for depositing onto a substrate a layer of polymerizable material, said material being characterized by the fact that it is chemically unstable at or below its boiling point, said method comprising:

vaporizing said material by continuously placing droplets of said material into contact with a heated surface which is maintained at a temperature at or above the boiling point for said material, but below the temperature at which said droplets would undergo pyrolysis before vaporizing;

maintaining at least a portion of said substrate at a temperature which is below the boiling point of said material and in a region which is at a lower pressure than said vaporized material, to provide a positive flow of vaporized material toward said substrate; and

directing the flow of vaporized material onto said substrate.

3. The method of claim 2 wherein the substrate is maintained in a region which is at a pressure below about 10^-1 Torr

4. The method of claim 2 wherein the material is polymerizable and cross-linkable and also comprising the step of polymerizing and cross-linking the material on said substrate.

5. The method of claim 4 wherein the material is polymerized and cross-linked throughout its thickness by use of electron beam curing.

6. A method for depositing a layer of a polymerizable material on a substrate comprising:

supplying a continuous liquid flow of said material at a temperature below both the decomposition and the polymerization temperature of said material;

continuously atomizing said liquid flow into a continuous flow of liquid droplets;

continuously vaporizing said liquid droplets by causing said droplets to contact a heated surface which is maintained at a temperature at or above the boiling point for said material but below the temperature at which said droplets would undergo pyrolysis before vaporizing;

maintaining at least a portion of said substrate at a temperature which is below the boiling point of said material and in a region which is at a lower pressure than said vaporized material, to provide a positive flow of vaporized material toward said substrate; and

directing the flow of vaporized material onto said substrate.

7. The method of claim 6 wherein the substrate is maintained in a region which is at a pressure below about 10^-1 Torr.

8. The method of claim 6 wherein the material is polymerizable and cross-linkable and also comprising the step of polymerizing or cross-linking the material on said substrate.

9. The method of claim 8 wherein the material is polymerized and/or cross-linked throughout its thickness by use of electron beam curing.

10. A method for continuously supplying a uniform vapor of a polymerizable material, said method comprising:

providing a liquid supply of said material, at a temperature below both the decomposition temperature and the polymerization temperature of said material, to a drop just contacting a flat face of a disk;

rotating the disk so that a fluid film is pulled on the face free from the drop and a continuous flow of liquid droplets is thrown from the periphery of the disk; and

continuously vaporizing said liquid droplets by causing said droplets to contact a heated surface which is maintained at a temperature at or above the boiling point for said material, but below the temperature at which said droplets would undergo pyrolysis before vaporizing.

11. A method according to claim 10 also comprising the steps of:

maintaining at least a portion of a substrate at a temperature which is below the boiling point of said material and in a region which is at a lower pressure than said vaporized material, to provide a positive flow of vaporized material toward said substrate; and

directing the flow vaporized material onto said substrate.

12. A method according to claim 11 wherein the substrate is maintained in a region which is at a pressure below about 10^-1 Torr.

13. A method according to claim 11 wherein the material is polymerizable and cross-linkable and also comprising the step of polymerizing and cross-linking the material on said substrate.

14. A method according to claim 13 wherein the material is polymerized and cross-linked throughout its thickness by use of radiation.

15. A method according to claim 14 wherein the source of radiation is an electron beam gun.

16. A method for continuously supplying a uniform vapor of a polymerizable material, said method comprising:

providing a liquid supply of said material, at a temperature below both the decomposition temperature and the polymerization temperature of said material, to an end surface at a tip of an ultrasonic vibration device;

ultrasonically vibrating said device so that the material supplied to the end surface coats the end surface and is dispersed in droplets from the periphery of the end surface; and

continuously vaporizing said liquid droplets by causing said droplets to contact a heated surface which is maintained at a temperature at or above the boiling point for said material, but below the temperature at which said droplets would undergo pyrolysis before vaporizing.

17. A method according to claim 16 wherein the ultrasonic vibration device is fixedly mounted at a nodal point.

18. A method according to claim 17 wherein the end surface is positioned with respect to the mounting of the device so as to be at the maximum amplitude of motion for the device while it is vibrating.

19. A method according to claim 16 also comprising the steps of:

maintaining at least a portion of a substrate at a temperature which is below the boiling point of said material and in a region which is at a lower pressure then said vaporized material, to provide a positive flow of vaporized material toward said substrate; and

directing the flow of vaporized material onto said substrate.

20. A method according to claim 19 wherein the substrate is maintained in a region which is at a pressure below about 10^-1 Torr.

21. A method according to claim 19 wherein the material is polymerizable and cross-linkable and also comprising the step of polymerizing and cross-linking the material on said substrate.

22. A method according to claim 21 wherein the material is polymerized and cross-linked throughout its thickness by use of radiation.

23. A method according to claim 22 wherein the source of radiation is an electron beam gun.