Magnetically filtered low loss scanning electron microscopy
First Claim
Patent Images
1. An electron apparatus including, in combination:
- means for producing an electron beam,means for directing said beam to a sample to be examined,means for producing a magnetic field in which said sample is immersed, anda detector for detecting electrons scattered from said sample, said detector being located in said magnetic field at a location such that only low-loss electrons scattered from said sample reach said detector.
1 Assignment
0 Petitions
Accused Products
Abstract
An electron microscope which includes a detector which is located in the magnetic field used to focus the primary electron beam onto the sample. The focusing magnetic field is used to energy-filter and/or energy analyze the scattered electrons without the need for additional equipment, such as a retarding-field energy filter. The magnetic field of the condenser-objective lens (or of any other type of magnetic lens) of the microscope provides the filtering and/or analyzing action, and the detector can be located so as to collect only low-loss electrons.
-
Citations
50 Claims
-
1. An electron apparatus including, in combination:
-
means for producing an electron beam, means for directing said beam to a sample to be examined, means for producing a magnetic field in which said sample is immersed, and a detector for detecting electrons scattered from said sample, said detector being located in said magnetic field at a location such that only low-loss electrons scattered from said sample reach said detector. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 47)
-
- 14. In an electron microscope having a sample to be examined located within a focussing magnetic field and means for scanning an electron beam across said sample, the improvement comprising a detector for collecting low-loss electrons scattered from said sample, said detector being located at a position in said magnetic field intercepted only by the trajectories of scattered low-loss electrons.
-
15. An apparatus, including:
-
means for producing a beam of charged particles, means for directing said beam of charged particles to a sample to be examined, means for producing a focussing electromagnetic field in which said sample is immersed, and a detector for detecting charged particles scattered from said sample, said detector being located in a position in said electromagnetic field such that the envelope of the trajectories of charged particles, scattered from said sample with essentially the same energy as the charged particles incident upon said sample are tangent to a surface of said detector. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 49)
-
-
23. A method for analyzing a sample with a beam of charged particles, including the following steps:
-
immersing a sample in an electromagnetic field, producing a beam of charged particles, directing said beam to said sample, collecting charged particles having a first energy range or scattering angle which are scattered from said sample to a detector located at a first position in said electromagnetic field, the trajectories of said scattered charged particles being determined by their energies after striking said sample and by said electromagnetic field, and moving said detector to a second location in said electromagnetic field to collect charged particles scattered from said sample at a second energy range or scattering angle. - View Dependent Claims (24, 25, 26)
-
-
27. An apparatus for examining a sample, including:
-
means for producing a beam of charged particles, means for directing said beam to a sample, field means for producing a field for focussing said beam of charged particles, the trajectories in said field of charged particles scattered from said sample being determined by the energies of said scattered charged particles and by said field, and detector means located in said field at a position where the charged particles striking said detector after scattering from said sample are those which have essentially the same energy as charged particles in said beam. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 50)
-
Specification