Alignment system for exposure apparatus
First Claim
1. An exposure apparatus for transferring a mask pattern to a wafer having a surface photoresist layer sensitive to a predetermined wavelength range, comprising:
- first mark position detection means for illuminating said wafer with single wavelength or quasi monochromatic light as first light, detecting a first mark on said wafer illuminated by said first light and providing first position data concerning the position of said first mark according to the result of said first mark detection;
second mark position detection means for illuminating said wafer with light having a wider wavelength distribution than said first light as second light, detecting a second mark on said wafer illuminated by said second light and providing second position data concerning the position of said second mark according to the result of said second mark detection; and
position determination means for determining relative positions of said wafer and said mark according to both said first and second position data.
1 Assignment
0 Petitions
Accused Products
Abstract
An exposure apparatus for transferring a mask pattern to a wafer having a surface photoresist layer. The apparatus is comprised of first and second detectors and a determination unit. The first detector includes a light-emitting system for generating first light to illuminate first marks on the substrate and provides first position data. The second mark position detector includes a light-emitting system for generating second light having a wider wavelength distribution than that of the first light to illuminate second marks on the substrate and provides second position data. Determination unit (EGA operational unit 502 or the like) is provided for determining the position of the substrate as a whole by using both of the first and second position data.
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Citations
4 Claims
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1. An exposure apparatus for transferring a mask pattern to a wafer having a surface photoresist layer sensitive to a predetermined wavelength range, comprising:
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first mark position detection means for illuminating said wafer with single wavelength or quasi monochromatic light as first light, detecting a first mark on said wafer illuminated by said first light and providing first position data concerning the position of said first mark according to the result of said first mark detection; second mark position detection means for illuminating said wafer with light having a wider wavelength distribution than said first light as second light, detecting a second mark on said wafer illuminated by said second light and providing second position data concerning the position of said second mark according to the result of said second mark detection; and position determination means for determining relative positions of said wafer and said mark according to both said first and second position data. - View Dependent Claims (2, 3, 4)
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Specification