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System for automatic inspection of periodic patterns

  • US 4,969,198 A
  • Filed: 05/16/1988
  • Issued: 11/06/1990
  • Est. Priority Date: 04/17/1986
  • Status: Expired due to Fees
First Claim
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1. In a system for the automatic inspection of two dimensional periodic patterns on printed circuit boards, photolithographic masks, patterned semiconductor wafers and the like wherein said pattern is scanned by image producing means, the improvement to said inspection system comprising:

  • (a) acquiring digital images of the same optical image pattern some predetermined plurality of times, N;

    (b) applying a low-level defect test to each of said digital images by comparing pixel greyscale values a repetition period away in either direction to produce a binary image where ones correspond to suspected defect pixels and all other pixels are set to zero;

    (c) adding the results of said low-level test to form an accumulator array corresponding pixel-wise to the digital images such that for a given optical image (N digital images) the pixels in the accumulator array will contain values ranging from 0 to N;

    (d) applying a preset first threshold level to each pixel level of the accumulator array;

    (e) sorting a neighborhood of the accumulator array for central pixels above said first threshold limit;

    (f) summing the value in the accumulator array of each sorted neighborhood to obtain a sum of values of each of the pixels considered for each sorted neighborhood associated with a respective central pixel, and(g) applying a second threshold to said sum such that if said sum is greater than or equal to the second threshold, the associated respective central pixel is considered a defect.

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