Device for the continuous determination of a surface state index for a moving creped sheet

• US 4,978,861 A
• Filed: 04/19/1989
• Issued: 12/18/1990
• Est. Priority Date: 09/17/1987
• Status: Expired due to Fees

• Current Assignee: Centre Technique De L'Industrie Des Papiers, Cartons Et Celluloses
• Original Assignee: Centre Technique De L'Industrie Des Papiers, Cartons Et Celluloses
• Inventors: Kerneis, Jean C., Bauduin, Serge, Sabater, Jacques
• Primary Examiner(s): Nelms, David C.
• Assistant Examiner(s): Allen, Stephone B.
• Application Number:
  US07/359,745
• Time in Patent Office: 608 Days
• Field of Search: 250/571, 250/572, 250/562, 356/371, 356/237, 356/238
• US Class Current: 250/559.23
• CPC Class Codes: B31F 1/14 by doctor blades arranged crosswise to the web
• CPC Class Codes: G01B 11/303 using photoelectric detection means

Abstract

A device for the continuous determination of a surface state index for a ing sheet, creped in the form of undulations, comprising a light source, a first optical system, a cell intended to receive the back-scattered beam and a system for processing the beam, wherein: the light source is a laser source; the first optical system is an astigmatic system, intended to adapt the size of the laser beam at the point where it meets the sheet to the average pitch of the said undulations in the moving creped sheet; the cell is an optoelectronic cell whose sensitive surface receives at least part of the back-scattered light, concentrated by a second convergent optical system; and the processing system comprises a means for determining a surface state index for the sheet from the electrical signals.

Claims

1. A device for continuously determining a surface state index of a moving sheet which is creped in the form of undulations, the device comprising:

a laser source which emits a beam toward a surface of the moving sheet;

a first astigmatic optical system positioned between said laser source and the moving sheet for concentrating said beam emitted by said laser source to form a luminous spot at an area of the moving sheet to be analyzed, said first optical system transforming a shape of said beam emitted by said laser source such that said luminous spot is adapted to the direction and dimension of average pitch of the undulations;

a second, convergent optical system disposed on the same side of the moving sheet as said first optical system for concentrating light which has been back-scattered by the moving sheet;

an optoelectronic cell for receiving said concentrated light from said second optical system at a sensitive surface thereof, said optoelectronic cell producing electrical signals responsive to an impacting position of said concentrated light on said sensitive surface; and

a processing system comprising means for determining the surface state index of the moving sheet using said electrical signals.

2. The device of claim 1, wherein the moving sheet consists of paper.

3. The device of claim 1, wherein the shape of said luminous spot is an ellipse, a major axis of said ellipse being parallel to the undulations and a minor axis of said ellipse having a length which is less than said average pitch of the undulations.

4. The device of claim 1, further comprising means for maintaining an average position of said concentrated light on said optoelectronic cell.

5. The device of claim 4, wherein said maintaining means consists of a mirror disposed in a path of said back-scattered light between the moving sheet and said second optical system.

6. The device of claim 1, further comprising a high-pass filter for filtering said electrical signals thereby removing stray low frequencies from said electrical signals passing therethrough.

7. The device of claim 6, further comprising at least one module for processing said filtered signal from said high-pass filter and thereby determining at least one value selected from the group consisting of a peak-to-peak value and an effective RMS value.

8. The device of claim 7, wherein said at least one module comprises a divider module for evaluating a form factor of said filtered signal from said high-pass filter, responsive to output from a module for determining said peak-to-peak value and output from a module for determining said RMS value.

9. The device of claim 8, further comprising means for evaluating said average pitch of the undulations.