Particle beam measuring method for non-contact testing of interconnect networks

• US 4,985,681 A
• Filed: 12/27/1985
• Issued: 01/15/1991
• Est. Priority Date: 01/18/1985
• Status: Expired due to Term

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Siemens AG
• Inventors: Frosien, Juergen, Brunner, Matthias, Schmitt, Reinhold, Lischke, Burkhard
• Primary Examiner(s): Wieder, Kenneth
• Assistant Examiner(s): Edmonds, W.
• Application Number:
  US07/813,875
• Time in Patent Office: 1,845 Days
• Field of Search: 324/51-54, 324/73 PC, 324/158 R, 324/71.3, 324/500, 324/501, 250/310, 250/311
• US Class Current: 324/501
• CPC Class Codes: G01R 31/305 using electron beams investigating or analysing materials by measuring photoelectric effect G01N23/227
• CPC Class Codes: G01R 31/50 Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections testing of sparking plugs H01T13/58

Abstract

For testing an interconnect network for shorts and interruptions, a point of the network to be tested is charged with a particle beam. Subsequently, a potential at least one further contact point is read with the same particle beam and an unaltered primary energy. An identification of potential occurs by documenting the secondary electrons triggered at the contact points. In order to avoid a disturbing change of potential during the measuring phase, the measuring time is only a fraction of the time for charging the network.

Claims

1. A particle beam measuring method for non-contact testing of an interconnect network for shorts and opens, comprising the steps of:

measuring reference signals at uncharged contact points before charging at least one point of the interconnect network, and intermediately storing the reference signals;

charging said at least one point of the interconnect network during a first time span by use of a particle beam of given energy directed to the at least one point;

subsequently directing the same particle beam with the same given energy to at least one further point of the same interconnect network; and

determining a potential at said at least one further point during a second time span by a measurement of secondary electrons emitted from said at least one further point, said second time span being significantly shorter in comparison to said first time span and the energy of said particle beam having the same value during both the first and second time spans.

2. A particle beam measuring method for non-contact testing of an interconnect network for shorts and interruptions, comprising the steps of:

charging at least one point of the interconnect network to a specific voltage potential during a first time duration of predetermined length by directing a particle beam of given energy to the at least one point;

measuring a voltage potential of at least one further point of the same interconnect network by directing a particle beam having an energy which is the same as an energy of the particle beam charging the at least one point for a second time duration whose length is substantially shorter in comparison to the first time duration length;

comparing the voltage potential at an end of the second time duration at said at least one further point with a reference potential; and

said reference potential being a voltage potential at said at least one further point determined in a calibration sequence before charging said at least one point.

3. A particle beam measuring method for non-contact testing of an interconnect network for shorts and interruptions, comprising the steps of:

charging at least one point of the interconnect network to a specific voltage potential during a first time duration of predetermined length by directing a particle beam of given energy to the at least one point;

measuring a voltage potential of at least one further point of the same interconnect network by directing a particle beam having an energy which is the same as an energy of the particle beam charging the at least one point for a second time duration whose length is substantially shorter in comparison to the first time duration length;

comparing the voltage potential at an end of the second time duration at said at least one further point with a reference potential; and

said reference potential comprising a voltage potential at a reference point in the interconnect network determined in a calibration sequence before charging said at least one point of the interconnect network.

4. A particle beam measuring method according to claim 3 including the step of monitoring the charging of said interconnect network at said at least one point to a desired voltage by detecting secondary electrons emitted therefrom.

5. A particle beam measuring method according to claim 3 including the step of quantitatively measuring voltage potentials at the charging point and further point by employing an opposing field spectrometer.

6. A particle beam measuring method according to claim 3 including the step of generating and measuring potentials at the charging point and the further point of the interconnect network with an electron beam.

7. A particle beam measuring method according to claim 3 wherein said particle beam is generated in a scanning electron microscope.

8. A particle beam measuring method according to claim 3 including the step of positioning said particle beam to a plurality of contact points of the interconnect network by a computer controlling a deflection system for the particle beam.

9. A particle beam measuring method according to claim 3 including the step of gating and blanking said particle beam by a computer controlling a beam blanking system for the particle beam.

10. A particle beam measuring method according to claim 3 including the step of depositing coordinates of a plurality of interrogated points of the network in a data memory.

11. A particle beam measuring method according to claim 3 including the step of intermediately storing secondary electron signals measured at interrogated points of the interconnect network.

12. A particle beam measuring method according to claim 3 including outputting a test protocol on a printer.

13. A particle beam measuring method according to claim 3 wherein said interconnect network is part of an LSI circuit.

14. A particle beam measuring method according to claim 3 wherein said interconnect network comprises a printed circuit board.

15. A particle beam measuring method according to claim 3 wherein said interconnect network comprises a wiring module.

16. A particle beam measuring method according to claim 3 wherein a plurality of further points are interrogated after charging the at least one point.