Method and apparatus for maintaining desired exposure levels

• US 4,987,044 A
• Filed: 05/31/1989
• Issued: 01/22/1991
• Est. Priority Date: 05/31/1989
• Status: Expired due to Term

• Current Assignee: DSM IP Assets BV (DSM-Firmenich AG)
• Original Assignee: E. I. du Pont de Nemours and Company (Corteva, Inc.)
• Inventors: Vassiliou, Eustathios
• Primary Examiner(s): Martin, Roland E.
• Application Number:
  US07/359,806
• Time in Patent Office: 601 Days
• Field of Search: 350/6.6, 430/20, 430/31, 430/39, 430/270, 430/499, 430/945, 219/121.74
• US Class Current: 430/20
• CPC Class Codes: G03F 7/0037 Production of three-dimensional images
• CPC Class Codes: G03F 7/70416 2.5D lithography
• CPC Class Codes: Y10S 430/146 Laser beam
• CPC Class Codes: Y10S 430/148 Light sensitive titanium compound containing

Abstract

A radiation beam used for selectively exposing a surface is moved in a helical path by means of two oscillating mirrors vibrating about axes that are mutually perpendicular. By maintaining a constant product for oscillating frequency and rotational oscillatory mirror deflection, the level of exposure can be made substantially constant.

Claims

1. A method for subjecting predetermined portions of a surface to desired exposure levels with a beam of radiation, comprising the steps of:

deflecting said beam towards said surface through a set of a first mirror and a second mirror, the first mirror having a first rotational axis, the second mirror having a second rotational axis;

oscillating said first mirror about said first axis at a desired frequency and effective amplitude with a substantially sinusoidal motion, and oscillating said second mirror about said second axis with a substantially sinusoidal motion at substantially said desired frequency and effective amplitude as employed for said first mirror, so that both mirrors are characterized by a common frequency value and a common effective amplitude value;

maintaining a substantially 90 degree phase difference between the sinusoidal motion of the first mirror and the sinusoidal motion of the second mirror;

tracing said surface with said beam in a spiral path by changing gradually and simultaneously the common value of the effective amplitude and the common value of the frequency inversely, so that the product of the two values is controlled so as to yield a desired exposure level on the traced surface when the beam is on; and

turning the beam off and on at predetermined angular positions in order to subject said predetermined portions of said surface located within the prearranged positions to a desired exposure level.

2. The method of claim 1 wherein said desired exposure is a constant exposure level.

3. The method of claim 1 wherein said first axis is perpendicular to said second axis.

4. The method of claim 1, wherein the product of the common value of frequency and the common value of effective amplitude is kept constant for maintaining substantially constant exposure.

5. The method of claim 4, wherein an additional step of common effective amplitude correction is superimposed for maintaining substantially constant exposure.

6. The method of claim 5, wherein a step of common frequency correction is superimposed for maintaining substantially constant exposure.

7. The method of claim 1, wherein the beam of radiation is a laser beam.

8. The method of claim 1, wherein the surface comprises a photographic constituent.

9. The method of claim 1, wherein the surface comprises a liquid crystal constituent.

10. The method of claim 1, wherein the surface comprises a xerographic constituent.

11. The method of claim 1, wherein the surface comprises a magnetic constituent.

12. The method of claim 1, wherein the surface comprises an ablating constituent.

13. The method of claim 1, wherein the surface comprises a deforming constituent.

14. The method of claim 1, wherein the surface comprises a photopolymer constituent.

15. The method of claim 1, wherein the surface is a photocurable composition, and further comprising the following steps in order to fabricate an integral three dimensional object from successive layers of the photocurable composition;

(a) forming a layer of the photocurable composition;

(b) photocuring at least a portion of the layer of the photocurable composition by exposure to the radiation beam;

(c) introducing a new layer of photocurable composition on the layer previously exposed to the radiation beam;

(d) photocuring at least a portion of the new layer by exposure to the radiation beam; and

(e) repeating steps (c) and (d) until a desired integral three dimensional object is fabricated.