Method of manufacturing capacitor
First Claim
1. A method of manufacturing a capacitor, comprising:
- a first step of nitriding a surface of a first conductive layer, to form a first nitride or oxynitride film;
a second step of depositing a second nitride film on a surface of said first nitride film;
a third step of forming an insulating film on a surface of said second nitride film; and
a fourth step of depositing a second conductive layer on a surface of said insulating film.
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Accused Products
Abstract
In the invention, the thin natural oxide film formed on a surface of a first polycrystalline silicon layer containing an impurity diffused at a high concentration is transformed into a silicon nitride film by rapid nitriding. When the resultant structure is placed in a low-pressure CVD furnace to deposit a silicon nitride film, no natural oxide film is grown on the polycrystalline silicon layer. Hence, when the invention is applied to manufacture of a capacitor for a memory cell, the inter-layer insulative film of the capacitor is not too thick. As a result, a reliable capacitor suitable for micropatterning of elements can be formed between the first and second polycrystalline silicon layers.
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Citations
13 Claims
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1. A method of manufacturing a capacitor, comprising:
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a first step of nitriding a surface of a first conductive layer, to form a first nitride or oxynitride film; a second step of depositing a second nitride film on a surface of said first nitride film; a third step of forming an insulating film on a surface of said second nitride film; and a fourth step of depositing a second conductive layer on a surface of said insulating film. - View Dependent Claims (2, 3, 4, 5)
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6. A method of manufacturing a capacitor, comprising the steps of:
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forming a first silicon oxide film on a surface of a silicon semiconductor substrate of a first conductivity type; depositing a first polycrystalline silicon layer on said first silicon oxide film; doping an impurity of a second conductivity type into said first polycrystalline silicon layer; forming a first silicon nitride or oxynitride film by nitriding a surface of said first polycrystalline silicon layer; depositing a second silicon nitride film on said first silicon nitride film; forming a second silicon oxide film on said second silicon nitride film; depositing a second polycrystalline silicon layer on said second silicon oxide film; and doping an impurity of the second conductivity type into said second polycrystalline silicon layer. - View Dependent Claims (7, 8, 9)
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10. A method of manufacturing a capacitor, comprising the steps of:
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forming a groove in a semiconductor substrate of a first conductivity type;
forming a first oxide film on an entire inner surface of said groove;depositing a first impurity layer of a second conductivity type on said first oxide film; forming a first nitride or oxynitride film by nitriding a surface of said first impurity layer; depositing a second nitride film on said first nitride film; forming a second oxide film on a surface of said second nitride film; and depositing a second impurity layer of the second conductivity type on said second oxide film. - View Dependent Claims (11, 12, 13)
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Specification