Electron microscope

• US 4,990,776 A
• Filed: 08/03/1988
• Issued: 02/05/1991
• Est. Priority Date: 08/28/1987
• Status: Expired due to Fees

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Koshishiba, Hiroya, Fushimi, Satoru
• Primary Examiner(s): Berman, Jack I.
• Application Number:
  US07/227,645
• Time in Patent Office: 916 Days
• Field of Search: 250/310, 250/397, 250/396 ML, 250/311, 250/491.1
• US Class Current: 250/310
• CPC Class Codes: G01R 31/305 using electron beams investigating or analysing materials by measuring photoelectric effect G01N23/227
• CPC Class Codes: H01J 2237/216 Automatic focusing methods
• CPC Class Codes: H01J 2237/2482 Optical means
• CPC Class Codes: H01J 37/21 Means for adjusting the focus
• CPC Class Codes: H01J 37/228 whereby illumination or light collection take place in the same area of the discharge
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence

Abstract

An auto-focusing electron microscope used for the observation, measurement and/or checking of a circuit pattern or the like comprises an objective lens capable of changing a focal position of an electron beam, an optical system for projecting a light and shade pattern having a light-permeable portion and a light-shielding portion onto the surface of a specimen through the objective lens, and a detector for detecting the projected pattern while optically reflecting it, whereby focusing can be made while reducing any damage and/or charging of the specimen.

Claims

1. An electron microscope comprising:

an objective lens capable of changing a focal position of an electron beam;

projection means for projecting a light and shade pattern having a light-permeable portion and a light-shielding portion onto the surface of a specimen through said objective lens; and

detecting means for optically reflecting the projected pattern and detecting the projected pattern projected onto the surface of the specimen for enabling focusing of the electron beam onto the specimen.

2. An electron microscope according to claim 1, further comprising control means for controlling a focal position of said objective lens in accordance with a signal detected by said detection means.

3. An electron microscope comprising:

an electromagnetic objective lens for changing a focal position of an electron beam;

optical projection means provided for projecting a stripe pattern onto the surface of a specimen;

detection means for detecting a contrast signal of the stripe pattern projected by said optical projection means; and

control means for controlling said electromagnetic objective lens to perform the focusing of the electron beam onto the specimen in accordance with the contrast signal detected by said detection means.

4. An electron microscope according to claim 3, wherein a reflection type of optical objective lens having an electron-permeable hole formed at a central portion thereof is provided as said optical projection means and said detection means in said electromagnetic objective lens.

5. An electron microscope according to claim 4, further comprising means for projecting the stripe pattern onto the specimen through said reflection type of optical objective lens by light in a predetermined wavelength region, first and second image sensors disposed with an image plane of said reflection type of optical objective lens interposed therebetween and at front and rear positions shifted from each other along an optical axis for detecting the stripe pattern projected on the specimen, and focal position detecting means for determining an in-focus position from a difference between contrast signals of the stripe pattern on said first and second image sensors.

6. An electron microscope according to claim 5, further comprising electron beam detecting means including a scintillator which is not excited by the stripe pattern projecting light in said predetermined wavelength region and the emission wavelength region of which is different from said predetermined wavelength region of the stripe pattern projecting light, a filter which does not pass therethrough the stripe pattern projecting light in said predetermined wavelength region, and a photomultiplier which detects light from said scintillator through said filter.