Method of making coatings on glass surfaces

• US 4,995,893 A
• Filed: 06/22/1989
• Issued: 02/26/1991
• Est. Priority Date: 06/23/1988
• Status: Expired due to Term

• Current Assignee: Pilkington PLC
• Original Assignee: Pilkington PLC
• Inventors: Porter, David A., Jenkins, Michael S., Simpson, Andrew F.
• Primary Examiner(s): Fisher, Richard V.
• Assistant Examiner(s): Bruckner, John J.
• Application Number:
  US07/369,739
• Time in Patent Office: 614 Days
• Field of Search: 65/3.12, 65/18.2, 65/60.2, 65/60.5, 427/167, 427/255.3, 423/336, 423/337
• US Class Current: 65/17.4
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 2217/213 SiO2
• CPC Class Codes: C03C 2217/282 Carbides, silicides
• CPC Class Codes: C03C 2218/152 by cvd

Abstract

Coatings, which act as barrier layers to inhibit migration of alkali metal ions from a glass surface and/or act as color suppressing underlayers for overlying infra-red reflecting or electrically conducting layers, are deposited by pyrolysis of a gaseous mixture of a silane, an unsaturated hydrocarbon and an oxygen-containing gas other than carbon dioxide which does not react with the silane at room temperature on a hot glass surface at a temperature of 600° C. to 750° C.

Claims

1. A process for forming an underlayer on a glass surface comprising directing on to the hot glass surface at a temperature of 600°

C. to 750°

C. a gaseous mixture of a silane, an unsaturated hydrocarbon compound and an oxygen-containing gas other than carbon dioxide which does not react chemically with the silane at approximately 20°

C. thereby depositing a transparent layer containing silicon and oxygen on the glass surface.

2. A process as claimed in claim 1, wherein the oxygen-containing gas is carbon monoxide.

3. A process as claimed in claim 1, wherein the oxygen-containing gas is an organic compound chosen from acetone, dimethylether, acetaldehyde and methanol.

4. A process as claimed in claim 1, wherein the oxygen-containing gas is ethylene oxide.

5. A process as claimed in claim 1, wherein the unsaturated hydrocarbon compound used in depositing the underlayer is an olefin containing 2 to 4 carbon atoms.

6. A process as claimed in claim 5, wherein the unsaturated hydrocarbon compound is ethylene.

7. A process as claimed in claim 1, which additionally comprises the step of depositing an infra-red reflecting and/or electrically conducting layer over the underlayer.

8. A process as claimed in claim 1, which additionally comprises the step of depositing a layer of semi-conductor metal oxide over the underlayer.

9. A process as claimed in claim 1, wherein the proportions of the component gases present in the gaseous mixture used to deposit the underlayer and the flow rate of the gaseous mixture over the hot glass surface are regulated to deposit an underlayer having a thickness in the range 60 nm to 80 nm and a refractive index in the range 1.6 to 1.8.

10. A process as claimed in claim 1, wherein the proportions of the component gases present in the gaseous mixture used to deposit the underlayer and the flow rate of the gaseous mixture over the hot glass surface are regulated to deposit an underlayer which has a thickness and refractive index such that the glass coated with the underlayer has a light transmission within 2% of the light transmission of the uncoated glass and which provides an effective barrier, as herein defined, to migration of alkali metal ions from the glass.