Method for forming oxide superconducting films with an ultrasonic wave sprayer

• US 5,002,928 A
• Filed: 11/09/1989
• Issued: 03/26/1991
• Est. Priority Date: 06/04/1987
• Status: Expired due to Fees

• Current Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
• Original Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
• Inventors: Tsunoda, Atsushi, Fukui, Keitaro, Okayama, Yasushi, Nakamura, Osamu
• Primary Examiner(s): Morgenstern, Norman
• Assistant Examiner(s): King, Roy V.
• Application Number:
  US07/433,456
• Time in Patent Office: 502 Days
• Field of Search: 505/1, 505/737, 505/734, 505/730, 427/62, 427/63, 427/314, 427/57, 427/110, 427/226, 427/168
• US Class Current: 505/401
• CPC Class Codes: B05B 17/0623 coupled with a vibrating horn
• CPC Class Codes: H10N 60/0324 from a solution
• CPC Class Codes: Y10S 505/734 From organometallic precursors, e.g. acetylacetonates
• CPC Class Codes: Y10S 505/737 From inorganic salt precursors, e.g. nitrates

Abstract

A thin film of a superconductor comprising composite metal oxides is formed by atomizing and spraying a homogeneous solution or solutions containing as solutes one or more of metal compounds capable of forming the superconductor, with an ultrasonic wave sprayer, onto a hot substrate to form the thin film, and the ultrasonic wave sprayer for forming the thin film of the superconductor comprises an ultrasonic wave-generating vibrator, feedstock supplier, atomized solution-escaping inhibitor, substrate supporter and heater, the ultrasonic wave-generating vibrator being connected through an axis to a solution-atomizing nozzle.

Claims

1. A method for forming a thin film of an oxide superconductor which comprises atomizing and spraying a homogeneous solution with a ultrasonic wave sprayer onto a substrate heated to a temperature of 200°

to 950°

C. to form an oxide film and then annealing said film, wherein said solution is selected from the group consisting of metal salts, metal halides, metal alkoxides and mixtures thereof capable of forming the superconductor.

2. The method according to claim 1, wherein the substrate is in a plane form or wire form.

3. The method according to claim 1, wherein said superconductor has a zero-resistance temperature of 58°

K or higher.

4. The method according to claim 1, wherein said thin film has a thickness of 0.1 to 200 microns.

5. The method according to claim 1, wherein the atomizing and spraying is effected in a continuous manner.

6. The method according to claim 1, wherein said solution is atomized and sprayed at a flow rate of 0.1 to 100 ml/min.

7. The method according to claim 1, wherein the atomized solution has particle size in the range of 0.5 to 1,000 microns.

8. The method according to claim 1, wherein said metal salts, metal halides and metal alkoxides are selected from the group consisting of a bismuth compound, a thallium compound, a yttrium compound, a copper compound, an erbium compound, a strontium compound, a calcium compound, a barium compound, a samarium compound, a holmium compound, a lanthanum compound, a lutetium compound, a neodynium compound, a terbium compound, a ytterbium compound, and mixtures thereof capable of forming the superconductor.