Multi-layered surface reflecting mirror
First Claim
1. A multi-layered surface reflecting mirror comprising a substrate, a metal or semiconductor film formed on one side of the substrate and a dielectric multi-layered film formed on the metal or semiconductor film, said dielectric multi-layered film consisting of a low refractive index material layer having an optical thickness in the range of 0.05 λ
- o (λ
o/20)-0.4 λ
o (2/5 λ
o), where λ
o is the wavelength of a light used as the reference measurement for design purposes, and a high refractive index material layer having an optical thickness of λ
o/2, said low refractive index material layer being closer to the metal or semiconductor film relative to said high refractive index material layer, and said high refractive index material layer being closer to the atmosphere relative to said low refractive index material layer.
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Accused Products
Abstract
A multi-layered surface reflecting mirror comprises a substrate, a metal or semiconductor film formed on one side of the substrate and a dielectric multi-layered film formed on the metal or semiconductor film. The dielectric multi-layered film consisting of a low refractive index material layer having an optical thickness of 0.05λo (λo/20)-0.4λo (2/5λo) (λo is the wavelength of a light used as the reference measurement for design purposes) and a high refractive index material layer having an optical thickness of λo/2. The low refractive index material layer existing closer to the metal or semiconductor film relative to the high refractive index material layer, and the high refractive index material layer existing closer to the atmosphere relative to the low refractive index material layer. The multi-layered surface reflecting mirror is used mainly as a rearview mirror for automobiles, a mirror with a convex surface that warns drivers against hazards on the road, an ornamental mirror, etc.
49 Citations
10 Claims
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1. A multi-layered surface reflecting mirror comprising a substrate, a metal or semiconductor film formed on one side of the substrate and a dielectric multi-layered film formed on the metal or semiconductor film, said dielectric multi-layered film consisting of a low refractive index material layer having an optical thickness in the range of 0.05 λ
- o (λ
o/20)-0.4 λ
o (2/5 λ
o), where λ
o is the wavelength of a light used as the reference measurement for design purposes, and a high refractive index material layer having an optical thickness of λ
o/2, said low refractive index material layer being closer to the metal or semiconductor film relative to said high refractive index material layer, and said high refractive index material layer being closer to the atmosphere relative to said low refractive index material layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
- o (λ
Specification