Systems having fixed and variable flow rate control mechanisms

• US 5,014,750 A
• Filed: 12/06/1989
• Issued: 05/14/1991
• Est. Priority Date: 03/14/1988
• Status: Expired due to Term

• Current Assignee: Baxter International Inc.
• Original Assignee: Baxter International Inc.
• Inventors: Winchell, David A., Mitchell, Richard J.
• Primary Examiner(s): Rosenthal, Arnold
• Application Number:
  US07/449,232
• Time in Patent Office: 524 Days
• Field of Search: 251/127, 251/7, 138/42, 138/43, 604/246, 604/257
• US Class Current: 138/43
• CPC Class Codes: A61M 2205/0244 Micromachined materials, e.g. made from silicon wafers, microelectromechanical systems [MEMS] or comprising nanotechnology
• CPC Class Codes: A61M 5/141 with capillaries for restricting fluid flow
• CPC Class Codes: A61M 5/16881 Regulating valves on-off valves, e.g. clamps A61M39/28

Abstract

The invention provides a flow control system well suited for use in intravenous fluid delivery systems comprising a flow restrictor wafer having one or more flow limiting flow restrictor paths formed thereon. The system provides fixed flow rate control. The system also provides means for selectively orienting at least two flow restrictor paths relative to the main fluid passage to varying the flow rate.

Claims

1. A fluid delivery system comprising

tubing means having an inlet connectable to a source of fluid and an outlet, said tubing means being operative for conveying fluid from the source to said outlet,

flow control means located between said inlet and said outlet and being operative for controlling the rate of fluid flow through said tubing within a range of at least two different discrete, preselected rates, said flow control means including a flow restrictor wafer having a substrate defining at least two enclosed restrictor paths, each path offering a different resistance to fluid flow corresponding with said discrete preselected flow rates, said flow restrictor wafer further including a wafer inlet and first and second openings, the first enclosed restrictor path extending between the wafer inlet and the first opening, the second enclosed restrictor path extending between the wafer inlet and the second opening, and

said flow control means further including selection mean for selectively directing fluid in said tubing means through a desired one of said flow restrictor paths, said selector means including a seal member which defines an inlet aperture in communication with said flow restrictor wafer inlet and said flow control means inlet and an outlet aperture in communication with said flow control means outlet, said seal member and said flow restrictor wafer being slidable relative to each other to maintain communication between said flow restrictor wafer inlet and said seal member inlet aperture and to selectively establish communication between said seal member outlet aperture and said flow restrictor wafer first or second opening.

2. A fluid delivery system according to claim 1

wherein said flow restrictor wafer further includes a manifold region between said first opening and said restrictor paths.

3. A fluid delivery system according to claim 1

wherein said flow restrictor wafer further includes third and fourth enclosed restrictor paths, each path offering a different resistance to fluid flow, and third and fourth openings, the third enclosed restrictor path extending between the wafer inlet and the third opening, the fourth enclosed restrictor path extending between the wafer inlet and the fourth opening, and said seal member additionally alternatively selectively establishing communication between said seal member outlet aperture and said flow restrictor third or fourth opening.

4. A fluid delivery system according to claim 1

further including a selector member carrying said flow restrictor wafer, said selector member being rotatable relative to said seal member to effectuate the sliding between said flow restrictor wafer and said seal member.

5. A fluid delivery system according to claim 1

wherein said substrate is formed of a crystalline material, and

wherein said flow restrictor path is etched in said substrate.