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Stage apparatus in exposing apparatus

  • US 5,015,866 A
  • Filed: 12/01/1989
  • Issued: 05/14/1991
  • Est. Priority Date: 12/05/1988
  • Status: Expired due to Term
First Claim
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1. An exposing apparatus for copy transferring a pattern formed on a mask onto a substrate, comprising:

  • a moving stage which is two-dimensionally movable in a predetermined exposure reference plane surface;

    inclination detecting means for detecting the inclination of the surface of the substrate in relation to said exposure reference plane surface;

    stage position detecting means for detecting the two-dimensional positions of the moving stage;

    a leveling stage which is mounted over the moving stage and supports the substrate and can incline the substrate in an arbitrary direction in relation to the exposure reference plane surface in cooperation with the inclination detecting means so that the surface of the substrate substantially coincides with the exposure reference plane surface;

    deviation detecting means for detecting two-dimensional deviation amounts of the substrate in relation to the moving stage which are caused in association with the inclination of the leveling stage; and

    control means for controlling the positions of the moving stage which are detected by the stage position detecting means in accordance with the deviation amounts which are detected by the deviation detecting means, thereby correcting the relative positional relation between the mask and the substrate.

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