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Gas phase selective beam deposition

  • US 5,017,317 A
  • Filed: 12/04/1989
  • Issued: 05/21/1991
  • Est. Priority Date: 12/04/1989
  • Status: Expired due to Fees
First Claim
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1. A method of producing a part comprising the steps of:

  • positioning a first gas phase proximate a target area;

    scanning the aim of at least one directed energy beam relative to said target area and selectively depositing material from said first gas phase in a first layer on said target area;

    positioning a second gas phase proximate said target area;

    scanning the aim of at least one directed energy beam relative to said target area and selectively depositing material from said second gas phase in a second layer on said target area, including the substeps ofjoining said first and second layers during the scanning and depositing of the second layer; and

    positioning successive gas phases over said target area and scanning the aim of at least one directed energy beam over said target area and selectively depositing material to produce successive layers joined to a previously deposited layer and producing a part comprising a plurality of joined layers.

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